Lithography Recipes: Difference between revisions
Jump to navigation
Jump to search
No edit summary |
No edit summary |
||
Line 16: | Line 16: | ||
*{{fl|SPR950-Positive-Resist-Datasheet.pdf|SPR950-0.8}} |
*{{fl|SPR950-Positive-Resist-Datasheet.pdf|SPR950-0.8}} |
||
*{{fl|SPR955-Positive-Resist-Datasheet.pdf|SPR955CM (SPR955CM-0.9, SPR955CM-1.8)}} |
*{{fl|SPR955-Positive-Resist-Datasheet.pdf|SPR955CM (SPR955CM-0.9, SPR955CM-1.8)}} |
||
*{{fl|UV6-Positive-Resist-Datasheet.pdf|UV6-0.7}} |
*{{fl|UV6-Positive-Resist-Datasheet.pdf|UV6-0.7}} |
||
*{{fl|UV210-Positive-Resist-Datasheet.pdf|UV210-0.3}} |
|||
;Negative Photoresists |
;Negative Photoresists |
||
Line 47: | Line 48: | ||
;Anti-Reflection Coatings |
;Anti-Reflection Coatings |
||
*{{fl|XHRiC-Anti-Reflective-Coating.pdf|XHRiC}} |
*{{fl|XHRiC-Anti-Reflective-Coating.pdf|XHRiC}} |
||
*{{fl|AR2-Anti-Reflective-Coating.pdf|AR2}} |
|||
*{{fl|DS-K101-Anti-Reflective-Coating.pdf|DS-K101 (developable BARC)}} |
|||
;Developers |
;Developers |
Revision as of 21:24, 22 April 2013
Lift-Off Techniques
Chemical Datasheets
|
|
Recipes
- R = Recipe is available. Clicking this link will take you to the recipe.
- A = Material is available for use, but no recipes are provided.