Revision as of 18:37, 2 July 2012

This table can be used to help located the needed recipe.

Vacuum Deposition Recipes
	E-Beam Evaporation				Sputtering					Thermal Evaporation		Plasma Enhanced Chemical Vapor Deposition (PECVD)			Atomic Layer Deposition	Ion-Beam Deposition (IBD)	Molecular Vapor Deposition
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3	Sputter 4	Sputter 5 (Lesker AXXIS)	Thermal 1	Thermal 2	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD
Ag
Al
Al₂O₃
AlN
Au
B
Co
Cr
Cu
Fe
Ge
Hf
HfO₂
In
Ir
ITO
Mo
Bn
Ni
Pd
Pt
Ru
Si
SiN
SiO₂
SiO_xN_y
Sn
SrF₂
Ta
Ta₂O₅
Ti
TiN
TiO₂
V
W
Zn
ZnO₂
Zr
ZrO₂

Recipes

Revision as of 18:37, 2 July 2012 (view source) Zwarburg (talk \| contribs) No edit summary ← Older edit		Revision as of 18:37, 2 July 2012 (view source) Zwarburg (talk \| contribs) (→‎Recipes) Newer edit →
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	==Ion-Beam Deposition (IBD)==		==Ion-Beam Deposition (IBD)==

	==Molecular Vapor Deposition (MVD)		==Molecular Vapor Deposition (MVD)==