Vacuum Deposition Recipes: Difference between revisions

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==E-Beam Evaporation==
==E-Beam Evaporation==
===Recipe 1===
===Recipe 1===
#Step 1 ....
#Step 2...

===Recipe 2===
===Recipe 2===



Revision as of 17:45, 9 July 2012

This table can be used to help located the needed recipe.

Vacuum Deposition Recipes

E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD)
Atomic Layer Deposition Ion-Beam Deposition (IBD) Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor)
Sputter 3 Sputter 4 Sputter 5 (Lesker AXXIS) Thermal 1 Thermal 2 PECVD 1
(PlasmaTherm 790)
PECVD 2
(Advanced Vacuum)
Unaxis VLR ICP-PECVD
Ag Y
Al
















Al2O3
AlN
















Au
B
















Co
Cr
















Cu
Fe
















Ge
Hf
















HfO2
In
















Ir
ITO
Mo
Bn
Ni
Pd
Pt
Ru
Si
SiN
SiO2
SiOxNy
Sn
SrF2
Ta
Ta2O5
Ti
TiN
TiO2
V
W
Zn
ZnO2
Zr
ZrO2

Recipes

E-Beam Evaporation

Recipe 1

  1. Step 1 ....
  2. Step 2...

Recipe 2

Sputtering

Thermal Evaporation

Plasma Enhanced Chemical Vapor Deposition (PECVD)

Atomic Layer Deposition (ALD)

Ion-Beam Deposition (IBD)

Molecular Vapor Deposition (MVD)