Dry Etching Recipes

Process Control Data

See linked page for process control data (dep rate/stress etc. over time), for a selection of often-used thin-film depositions.

Dry Etching Tools/Materials Table

• R: Recipe is available. Clicking this link will take you to the recipe.
• A: Material is available for use, but no recipes are provided.

Dry Etching Recipes
	RIE Etching			ICP Etching						Oxygen Plasma Systems					Other Dry Etchers
Material	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	DSEIII (PlasmaTherm)	Fluorine ICP (PlasmaTherm)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	Oxford ICP (PlasmaPro 100)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)		Plasma Clean (YES EcoClean)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)
Ag																	A
Al			A			R1	R1										A
Au																	R1
Cr			A			R1	A										A
Cu																	A
Ge						A	A								A		A
Mo																	A
Nb						A	A
Ni																	R1
Os						A	A
Pt																	R1
Ru						A	R1										A
Si				R1	R1			A							R1		A
Ta						A	A										A
Ti						R1	A										A
Al2O3						A	R										A
Al2O3 (Sapphire)						R1	A										A
AlGaAs			R1			R1		R	GaAs-AlGaAs Etch (Unaxis VLR)								A
AlGaN								R	R1								A
AlN									R1								A
BCB						A
CdZnTe	R1																A
GaAs			R1			R1	R1	R	GaAs-AlGaAs Etch (Unaxis VLR)								A
GaN			R1			R1	A	R	R1								A
GaSb						A	A	A	GaSb Etch Unaxis VLR)								A
HfO2																	A
InGaAlAs	InP-InGaAsP-InGaAlAs Etching (RIE 2)							A	InP-InGaAs-InAlAs Etch (Unaxis VLR)								A
InGaAsP	InP-InGaAsP-InGaAlAs Etching (RIE 2)							R	InP-InGaAs-InAlAs Etch (Unaxis VLR)								A
InP	InP-InGaAsP-InGaAlAs Etching (RIE 2)					A	A	R	InP-InGaAs-InAlAs Etch (Unaxis VLR)								R1
ITO	R1																A
LiNbO3																	A
Photoresist & ARC		A	R		R	R	R			R		R					A
Ru						A	R
SiC						R1	A										A
SiN		SiNx Etching (RIE 3)			A	R1	R1			A							A
SiO2		SiO2 Etching (RIE 3)			R1	R1	R1									R1	A
SiOxNy						A	A										A
SU8						A
Ta2O5						A	A										A
TiN																	A
TiO2																	A
W-TiW						R1	A										A
ZnO2																	A
ZnS	R1																A
ZnSe	R1																A
ZrO2																	A
Material	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	DSEIII (PlasmaTherm)	Fluorine ICP (PlasmaTherm)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	Oxford ICP (PlasmaPro 100)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)		Plasma Clean (YES EcoClean)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)