Maskless Aligner (Heidelberg MLA150)

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Maskless Aligner (Heidelberg MLA150) File:MLA150.jpg Tool Type Lithography Location Bay 6 Supervisor Biljana Stamenic Supervisor Phone (805) 893-4002 Supervisor E-Mail biljana@ece.ucsb.edu Description Maskless I-Line Photolithography Manufacturer Heidelberg Instruments Model MLA150 Materials I-Line Photoresists

About

The MLA150 allows for arbitrary direct patterning of I-Line photoresists, directly from a CAD drawing/file, and alignment to arbitrary features on the sample. The system uses a optical digital light process (MEMS light-field patterning) to programatically expose digitized patterns directly onto the sample - no glass photomasks/reticles are required.

Detailed Specifications

• Wafer size:
• Wafer / substrate thickness:
• Exposure optics:
  • Laser #1:
  • Laser #2:
• Focus modes:
• Alignment:
  • Modes?
  • Accuracy:
  • Repetability

• Additional manufacturer options (none installed on our systems):
  • Focus option?
  • Dual lasers?
  • High-resolution option?

• Uniformity:
• Write speeds:

Documentation

• MLA150 - Standard Operating Procedure

Design Tools/Info

• MLA150 - Design Guidelines
• MLA150 - CAD Files and Templates