Process Group - Process Control Data

These are the same links found on individual tool pages, in the Recipes > <<tool page>> > Process Control section.

Deposition (Process Control Data)

PECVD #1 (PlasmaTherm 790)

• PECVD#1: Plots of all data
• PECVD#1: SiO₂
• PECVD#1: Si₃N₄

PECVD #2 (Advanced Vacuum)

• PECVD#2: Plots of all data
• PECVD#2: SiO₂
• PECVD#2: Si₃N₄
• PECVD#2: Low-Stress Si₃N₄
  • Plots of Low-Stress Si₃N₄ Data

ICP-PECVD (Unaxis VLR Dep)

• ICP-PECVD: Plots of SiO₂ Films
• ICP-PECVD: Plots of Si₃N₄ Films
• ICP-PECVD: SiO₂ Low-Dep Rate (LDR)
• ICP-PECVD: SiO₂ High-Dep Rate (HDR)
• ICP-PECVD: Si₃N₄
• ICP-PECVD: Si₃N₄ Low-Stress

Ion Beam Sputter Deposition (Veeco Nexus)

• IBD: Plots of all data
• IBD: SiO₂
• IBD: Si₃N₄
• IBD: Ta₂O₅
• IBD: Al₂O₃
• IBD: TiO₂

Old Data (Pre 2022)

Old data in a different format can be found below:

• Old Deposition Data - 2021-12-15

Etching (Process Control Data)

PlasmaTherm SLR Fluorine Etcher

• SiO₂ Etching with CHF3/CF4 - Etch Data
• SiO₂ Etching with CHF3/CF4 - Plots

OLD Process Control Data

• SiO₂ Etching with CHF3/CF4 (FL-ICP) - No data prior to 2023-01-20

Panasonic ICP #1

• SiO2 Etching with CHF3/CF4 - ICP1

Panasonic ICP#2

• SiO2 Etching with CHF3/CF4 - ICP2

Unaxis VLR Etch

• InP Etching with Cl2/N2 @ 200°C - Unaxis Etch

Oxford PlasmaPro Cobra Etcher

• InP Ridge Etch with Cl2/CH4/H2 @ 60°C