User contributions for Ningcao

31 January 2019

• 19:0619:06, 31 January 2019 diff hist −3‎ Test Data of etching SiO2 with CHF3/CF4 ‎ add a SEM pic Tag: Visual edit
• 19:0519:05, 31 January 2019 diff hist −3‎ Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎ add a SEM pic Tag: Visual edit
• 17:2617:26, 31 January 2019 diff hist −37‎ Test Data of etching SiO2 with CHF3/CF4 ‎ add one more SEM pic Tag: Visual edit
• 17:2417:24, 31 January 2019 diff hist +119‎ Test Data of etching SiO2 with CHF3/CF4 ‎ add a SEM pic Tag: Visual edit
• 17:2317:23, 31 January 2019 diff hist 0‎ File:SiO2 Etch using ICP2-no O2.pdf ‎ Ningcao uploaded a new version of File:SiO2 Etch using ICP2-no O2.pdf current
• 17:2217:22, 31 January 2019 diff hist +84‎ Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎ add one SEM pic Tag: Visual edit
• 17:2017:20, 31 January 2019 diff hist 0‎ File:SiO2 Etch using ICP2 with O2.pdf ‎ Ningcao uploaded a new version of File:SiO2 Etch using ICP2 with O2.pdf current

29 January 2019

• 19:2219:22, 29 January 2019 diff hist +2‎ Test Data of etching SiO2 with CHF3/CF4 ‎No edit summary Tag: Visual edit
• 19:2219:22, 29 January 2019 diff hist +2‎ Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎No edit summary Tag: Visual edit
• 19:2019:20, 29 January 2019 diff hist +2‎ Test Data of etching SiO2 with CHF3/CF4-ICP1 ‎No edit summary Tag: Visual edit
• 19:1719:17, 29 January 2019 diff hist −5‎ ICP Etching Recipes ‎ →‎SiO2 Etching (Panasonic 1) Tag: Visual edit
• 19:1619:16, 29 January 2019 diff hist +5‎ ICP Etching Recipes ‎ →‎SiO2 Etching (Panasonic 1) Tag: Visual edit
• 19:1419:14, 29 January 2019 diff hist +63‎ Test Data of etching SiO2 with CHF3/CF4-ICP1 ‎No edit summary Tag: Visual edit
• 19:1419:14, 29 January 2019 diff hist 0‎ N File:I11901.pdf ‎No edit summary current
• 19:0919:09, 29 January 2019 diff hist +238‎ N Test Data of etching SiO2 with CHF3/CF4-ICP1 ‎ Created page with "{| class="wikitable" | colspan="5" |ICP#1: 0.5Pa, 50/900W, CHF3/CF4=10/30 sccm, time=210 sec |- |Date |Sample# |Etch Rate (nm/min) |Etch Selectivity (SiO2/PR) |Averaged Si..." Tag: Visual edit
• 19:0619:06, 29 January 2019 diff hist +45‎ ICP Etching Recipes ‎ →‎SiO2 Etching (Panasonic 1) Tag: Visual edit
• 18:5718:57, 29 January 2019 diff hist 0‎ N File:I11902.pdf ‎No edit summary current
• 18:4618:46, 29 January 2019 diff hist +87‎ Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎No edit summary Tag: Visual edit
• 18:4518:45, 29 January 2019 diff hist −169‎ Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎No edit summary Tag: Visual edit
• 18:4318:43, 29 January 2019 diff hist +82‎ Test Data of etching SiO2 with CHF3/CF4 ‎No edit summary Tag: Visual edit
• 18:4018:40, 29 January 2019 diff hist +33‎ Test Data of etching SiO2 with CHF3/CF4 ‎No edit summary Tag: Visual edit
• 18:3618:36, 29 January 2019 diff hist +244‎ Test Data of etching SiO2 with CHF3/CF4 ‎No edit summary Tag: Visual edit
• 18:3018:30, 29 January 2019 diff hist −403‎ Test Data of etching SiO2 with CHF3/CF4 ‎ Blanked the page Tag: Visual edit
• 18:2618:26, 29 January 2019 diff hist +40‎ Test Data of etching SiO2 with CHF3/CF4 ‎No edit summary Tag: Visual edit
• 18:2218:22, 29 January 2019 diff hist 0‎ Test Data of etching SiO2 with CHF3/CF4 ‎ add a table Tag: Visual edit
• 18:1918:19, 29 January 2019 diff hist +7‎ Test Data of etching SiO2 with CHF3/CF4 ‎No edit summary Tag: Visual edit
• 18:1318:13, 29 January 2019 diff hist −45‎ Test Data of etching SiO2 with CHF3/CF4 ‎No edit summary Tag: Visual edit
• 18:1118:11, 29 January 2019 diff hist +4‎ ICP Etching Recipes ‎ →‎SiO2 Etching (Panasonic 1) Tag: Visual edit
• 18:0618:06, 29 January 2019 diff hist +113‎ ICP Etching Recipes ‎ →‎SiO2 Etching (Panasonic 1) Tag: Visual edit
• 17:4717:47, 29 January 2019 diff hist −30‎ ICP Etching Recipes ‎ →‎ICP Etch 1 (Panasonic E626I) Tag: Visual edit
• 17:4717:47, 29 January 2019 diff hist +85‎ ICP Etching Recipes ‎ /* SiO2 Etching with ICP1 Tag: Visual edit
• 17:4217:42, 29 January 2019 diff hist +87‎ Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎ add a pic Tag: Visual edit
• 17:3817:38, 29 January 2019 diff hist +2‎ Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎ add a pic Tag: Visual edit
• 17:3717:37, 29 January 2019 diff hist 0‎ N File:SiO2 Etch using ICP2 with O2-a.pdf ‎No edit summary current
• 17:3717:37, 29 January 2019 diff hist +34‎ Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎ add data Tag: Visual edit
• 17:2517:25, 29 January 2019 diff hist +4‎ Test Data of etching SiO2 with CHF3/CF4 ‎ add a new pic Tag: Visual edit
• 17:2417:24, 29 January 2019 diff hist 0‎ N File:SiO2 Etch using ICP2-no O2-a.pdf ‎No edit summary current
• 17:1617:16, 29 January 2019 diff hist +34‎ Test Data of etching SiO2 with CHF3/CF4 ‎ add data Tag: Visual edit

11 December 2018

• 19:0619:06, 11 December 2018 diff hist 0‎ InP Etch Rate and Selectivity (InP/SiO2) ‎No edit summary
• 19:0519:05, 11 December 2018 diff hist 0‎ InP Etch Rate and Selectivity (InP/SiO2) ‎No edit summary
• 19:0319:03, 11 December 2018 diff hist +77‎ N File:IP180805.pdf ‎ Created page with "thumb"
• 18:5618:56, 11 December 2018 diff hist 0‎ N File:IP180909.pdf ‎No edit summary current
• 18:5118:51, 11 December 2018 diff hist +38‎ InP Etch Rate and Selectivity (InP/SiO2) ‎No edit summary

11 October 2018

• 23:1623:16, 11 October 2018 diff hist +2‎ Lithography Recipes ‎ →‎Holography Recipes
• 23:1523:15, 11 October 2018 diff hist 0‎ N File:Holography Process for 1D-lines and 2D-dots (ARC-11 & THMR-IP3600HP-D)-updated-8-13-2018-A.pdf ‎No edit summary current

9 October 2018

• 15:3715:37, 9 October 2018 diff hist +78‎ Test Data of etching SiO2 with CHF3/CF4 ‎No edit summary Tag: Visual edit
• 15:3315:33, 9 October 2018 diff hist +41‎ Test Data of etching SiO2 with CHF3/CF4 ‎No edit summary Tag: Visual edit
• 15:3015:30, 9 October 2018 diff hist −41‎ Test Data of etching SiO2 with CHF3/CF4 ‎No edit summary Tag: Visual edit
• 15:2815:28, 9 October 2018 diff hist +80‎ Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎No edit summary Tag: Visual edit
• 15:2515:25, 9 October 2018 diff hist +250‎ N Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎ Created page with "{| class="wikitable" | colspan="5" |ICP#2: 0.5Pa, 50/500W, CHF3/CF4/O2=35/5/10sccm, time=210 sec |- |Date |Sample# |Etch Rate (nm/min) |Etch Selectivity (SiO2/PR) |Averaged..." Tag: Visual edit