ASML 5500: Choose Marks for Prealignment

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Revision as of 16:47, 28 March 2018 by John d (talk | contribs) (initial, instructions on how to edit Optical Prealignment alignment choice)
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How to edit your job and choose which alignment marks the system will use for optical prealignment, performed on the P-Chuck (before wafer is moved to the exposure E-Chuck).

  1. Edit your job with Modify Job
  2. Go to Layer Layout > Process Data
  3. Use Layer: (Prev) / (Next) to select the layer you need to change alignment marks for
  4. Under Prealignment Mode: Selection: Mark 1___ & Mark 2___ choose the alignment marks to align to, and use a microscope to make sure these alignment marks are (a) present on your wafer and (b) look ok with no defects.
    1. The wafer schematic shows which alignment marks you are choosing.
    2. The alignment marks, defined on a previous layer (usually combined with the first litho), are programmed/named in: <to be added: where in the program the AlMks are defined>
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