Automated Coat/Develop System (S-Cubed Flexi)

Automated Coat/Develop System (S-Cubed Flexi) Tool Type Lithography Location Bay 7 Supervisor Tony Bosch Supervisor Phone (805) 893-3486 Supervisor E-Mail bosch@ece.ucsb.edu Description Automatic Coat/Bake/Develop Manufacturer S-Cubed Lithography Recipes

THIS TOOL IS ONLY FOR STAFF USE AT THIS TIME.

About

To Be Added

Detailed Specifications

• Wafer Size: 100mm (150mm possible but not set up)
• PR Coating Properties:
  • Uniformity < 1.0%
  • < 100 particles on 100mm wafer
• Photoresists/Underlayers Available:
  • UV6-0.8
  • DS-K101-304
  • PMMA
  • PMGI SF11
  • PMGI SF5
• Solvents Available:
  • EBR100
• Developers Available:
  • AZ 300 MiF

Process Information

• Recipe Page for S-Cubed Coater: Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi)
• See the Photolith. Chemicals page for info on the installed resists.

Operating Procedures

• To Be Added