Difference between revisions of "DUV Flood Expose"
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| − | <nowiki><nowiki>Insert non-formatted text here</nowiki><nowiki><nowiki>Insert non-formatted text here</nowiki></nowiki></nowiki>{{tool|{{PAGENAME}} |
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|picture=DUV.jpg |
|picture=DUV.jpg |
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|type = Lithography |
|type = Lithography |
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| − | |super= |
+ | |super= Lee Sawyer |
| + | |super2= Bill Millerski |
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| − | |phone=(805)839-3918x219<br |
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| − | | |
+ | |phone=(805)893-2123 |
|location=Bay 6 |
|location=Bay 6 |
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| − | |email= |
+ | |email=lee_sawyer@ucsb.edu |
| − | |description = Deep UV Flood |
+ | |description = 1000W Deep UV Flood Exposure System (LS-150X-10C2) and Illumination Controller (2130-C2) |
| − | |manufacturer = AB Manufacturing |
+ | |manufacturer = Bachur & Associates/AB Manufacturing |
|materials = |
|materials = |
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}} |
}} |
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| − | = |
+ | ==About== |
This unit consists of a collimated deep ultraviolet (DUV) light source (mercury gas discharge short arc lamp) and power supply. The substrate is placed on a rotating chuck (not presently working) and is exposed by opening a timer-controlled shutter. |
This unit consists of a collimated deep ultraviolet (DUV) light source (mercury gas discharge short arc lamp) and power supply. The substrate is placed on a rotating chuck (not presently working) and is exposed by opening a timer-controlled shutter. |
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Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc. |
Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc. |
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| − | =Detailed Specifications= |
+ | ==Detailed Specifications== |
| + | |||
| − | *DUV wavelengths are 200-260 nm; the lamp power is limited to |
+ | *DUV wavelengths are 200-260 nm; the lamp power is limited to 1000 watts and can operate in either constant intensity or constant power mode |
*The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample |
*The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample |
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*Exposure can be performed on a 4" wafer |
*Exposure can be performed on a 4" wafer |
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*Lamps are nominally rated for 400 hours |
*Lamps are nominally rated for 400 hours |
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*A reset timer was added in Feb. 1995 to limit "on" time (ie. provide for auto shut-off) for bulb life conservation |
*A reset timer was added in Feb. 1995 to limit "on" time (ie. provide for auto shut-off) for bulb life conservation |
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| + | |||
| − | =Spectra Images= |
+ | ==Spectra Images== |
| − | ==Aligner with No Filter== |
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| + | |||
| − | [[image:DUV-Spectra-No-Filter.png|thumb|none|600px|Aligner with No Filter]] |
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| ⚫ | |||
| − | ==Aligner with Filter for i-line Exposure== |
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| − | [[image:DUV-Spectra-With-Filter.png|thumb|none|600px|Aligner with Filter for i-line Exposure]] |
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| ⚫ | |||
[[image:DUV-System-Spectra.png|thumb|none|600px|DUV Exposure System Spectra]] |
[[image:DUV-System-Spectra.png|thumb|none|600px|DUV Exposure System Spectra]] |
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| + | |||
| + | ==Documentation== |
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| + | |||
| + | *[https://signupmonkey.ece.ucsb.edu/wiki/images/2/27/DUV_Flood_Expose_SOP.pdf DUV Flood Expose Standard Operating Procedure] |
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Latest revision as of 09:12, 30 August 2022
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About
This unit consists of a collimated deep ultraviolet (DUV) light source (mercury gas discharge short arc lamp) and power supply. The substrate is placed on a rotating chuck (not presently working) and is exposed by opening a timer-controlled shutter.
Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc.
Detailed Specifications
- DUV wavelengths are 200-260 nm; the lamp power is limited to 1000 watts and can operate in either constant intensity or constant power mode
- The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample
- Exposure can be performed on a 4" wafer
- Lamps are nominally rated for 400 hours
- A reset timer was added in Feb. 1995 to limit "on" time (ie. provide for auto shut-off) for bulb life conservation
