ICP Etching Recipes

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

• Single-step Si Vertical Etch Recipe

ICP Etch 1 (Panasonic E626I)

SiO₂ Etching (Panasonic 1)

• SiO₂ Vertical Etch Recipe Parameters
• SiO₂ CHF3 Etch Variations

Al Etch (Panasonic 1)

• Al Etch Recipes

Cr Etch (Panasonic 1)

• Cr Etch Recipes

Ti Etch (Panasonic 1)

• Ti Deep Etch Recipes

AlGaAs Etch (Panasonic 1)

• AlGaAs Etch Recipes

GaN Etch (Panasonic 1)

• GaN Etch Recipes

ICP Etch 2 (Panasonic E640)

SiO₂ Etching (Panasonic 2)

• SiO₂ Vertical Etch Recipe - CHF₃
• SiO₂ Nanoscale Etch Recipe - CHF₃/O₂

SiN_x Etching (Panasonic 2)

• SiN_x Nanoscale Etch Recipe - CHF3/O2

Al Etch (Panasonic 2)

• Al Etch Recipes - use panasonic 1 parameters, etch rate 50% higher

GaAs Etch (Panasonic 2)

• GaAs Etch Recipes - Panasonic 2

ICP-Etch (Unaxis VLR)

GaAs Etch

• GaAs Etch Recipe (30C)

AlGaAs Etch

• AlGaAs Etch Recipe (30C)

InP Etch (Unaxis VLR)

InP Etch

• InP Etch Recipe (200C)
• InP-based Material Etch Profile (200C)

InP Etch (H₂ Ar)

• InP Etch Recipe (H₂ Ar 200C)
• InP-InGaAs Etch Profile (H₂ Ar 200C)

GaN Etch (Unaxis VLR)

• GaN Etch Recipe (85C)