Difference between revisions of "Lithography Recipes"

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*{{fl|AZ5214-Negative-Resist-Datasheet.pdf|AZ5214}}  
 
*{{fl|AZ5214-Negative-Resist-Datasheet.pdf|AZ5214}}  
 
*{{fl|AZnLOF5510-Negative-Resist-Datasheet.pdf|AZnLOF5510}}  
 
*{{fl|AZnLOF5510-Negative-Resist-Datasheet.pdf|AZnLOF5510}}  
−
*{{fl|AZnLOF2020-Negative-Resist-Datasheet.pdf|AZnLOF2000 (AZnLOF2020, AZnLOF2035, AZnLOF2070)}}
+
*{{fl|AZnLOF2020-Negative-Resist-Datasheet.pdf|AZnLOF2000 (AZnLOF2020, AZnLOF2035, AZnLOF2070)}}
 +
*{{fl|UVN2300-Negative-Resist-Datasheet.pdf|UVN2300-0.5}}
  
 
;Underlayers
 
;Underlayers

Revision as of 14:17, 22 April 2013

Lift-Off Techniques

Chemical Datasheets

Positive Photoresists
Negative Photoresists
Underlayers
E-beam resists
Nanoimprinting
Contrast Enhancement Materials
Anti-Reflection Coatings
Developers
Photoresist Removers

Recipes

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.


Lithography Recipes

 Contact Aligners Steppers Flood Expose E-Beam Lithography
Positive Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


AZ4110 R R
AZ4210 R R





AZ4330RS R R
OCG 825-35CS







SPR 950-0.8
SPR 955 CM-0.9

R R



SPR 955 CM-1.8 R R
SPR 220-3.0 R R R R



SPR 220-7.0 R R R R
THMR-IP3600 HP D







UV6-0.7
Negative Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


AZ5214-EIR R R R R
AZnLOF 2020 R R R R
AZnLOF 2035
AZnLOF 2070
AZnLOF P5510 R R
UVN30-0.5
SU-8 2015
Underlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


PMGI SF-11







PMGI SF-15
LOL 2000
XHRIC-11 (BARC)
AR-2 (BARC)
DS-K 101-307 (BARC)
Overlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


CEM-365 IS
E-Beam Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


 ??????
 ???????
Nanoimprint Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


MR-I 7020
Nanonex NX-1020
SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)


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