Maskless Aligner (Heidelberg MLA150)
Work In Progress
This article is still under construction. It may contain factual errors. Content is subject to change.
The MLA150 allows for arbitrary direct patterning of I-Line photoresists, directly from a CAD drawing/file, and alignment to arbitrary features on the sample. The system uses a optical digital light process (MEMS light-field patterning) to programatically expose digitized patterns directly onto the sample - no glass photomasks/reticles are required.
- Wafer size:
- Wafer / substrate thickness:
- Exposure optics:
- Laser #1:
- Laser #2:
- Focus modes:
- Additional manufacturer options (none installed on our systems):
- Focus option?
- Dual lasers?
- High-resolution option?
- Write speeds:
- Recipes > Lithography > Maskless Aligner MLA150
- Starting recipes for various I-Line photoresists