Difference between revisions of "Molecular Vapor Deposition"
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|picture=MVD.jpg | |picture=MVD.jpg | ||
|type = Vacuum Deposition | |type = Vacuum Deposition | ||
|super= Lee Sawyer | |super= Lee Sawyer | ||
| + | |super2= Aidan Hopkins | ||
|phone=(805) 893-2123 | |phone=(805) 893-2123 | ||
|location=Bay 4 | |location=Bay 4 | ||
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==Recipes== | ==Recipes== | ||
| − | *[https:// | + | *[https://wiki.nanotech.ucsb.edu/w/index.php?title=Lithography_Recipes#Nanoimprinting_Recipes Nanoimprinting recipes] using FDTS non-stick layer |
*[https://signupmonkey.ece.ucsb.edu/wiki/images/3/3c/MVD_Standard_Recipes.pdf MVD Standard Recipes] | *[https://signupmonkey.ece.ucsb.edu/wiki/images/3/3c/MVD_Standard_Recipes.pdf MVD Standard Recipes] | ||
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*[https://signupmonkey.ece.ucsb.edu/wiki/images/f/f4/MVD_SOP.pdf MVD Standard Operating Procedure] | *[https://signupmonkey.ece.ucsb.edu/wiki/images/f/f4/MVD_SOP.pdf MVD Standard Operating Procedure] | ||
| + | *[[MVD - Wafer Coating - Process Traveler|Wafer Coating - Process Traveler]] | ||
Latest revision as of 10:34, 30 August 2022
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About
The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.
Recipes
- Nanoimprinting recipes using FDTS non-stick layer
- MVD Standard Recipes