Difference between revisions of "Oxford ICP Etcher - Process Control Data"
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(pasted ICP2 data table) |
(in progress InP Ridge Etch) |
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| − | == Data - InP Ridge Etch (Oxford ICP Etcher) == | + | ==Data - InP Ridge Etch (Oxford ICP Etcher)== |
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{| class="wikitable" | {| class="wikitable" | ||
| − | | colspan="5" | | + | | colspan="5" |InP Ridge Etch: INSERT ETCH PARAMS (IPC< Pressure, gasses etc.) |
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|Sample# | |Sample# | ||
|Etch Rate (nm/min) | |Etch Rate (nm/min) | ||
| − | |Etch Selectivity (SiO2 | + | |Etch Selectivity (InP/SiO2) |
| − | | | + | |Comments |
|SEM Images | |SEM Images | ||
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| − | | | + | |2022-01-11 |
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| − | | | + | |Software timing bugs fixed - new etch rate appears slightly higher. |
| − | |[https://wiki.nanotech.ucsb.edu/ | + | |[https://wiki.nanotech.ucsb.edu/w/images/c/c3/I2210308.pdf] (wrong) |
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| − | | | + | |2022-01-11 |
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| − | |[https://wiki.nanotech.ucsb.edu/ | + | |[https://wiki.nanotech.ucsb.edu/w/images/2/28/I2210411.pdf] (wrong) |
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| − | | | + | |2022-01-21 |
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| − | + | |[https://wiki.nanotech.ucsb.edu/w/images/2/26/I2210508.pdf] (wrong) | |
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| − | |[https://wiki.nanotech.ucsb.edu/w/images/2/26/I2210508.pdf] | ||
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Revision as of 14:24, 13 January 2022
Data - InP Ridge Etch (Oxford ICP Etcher)
 Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change. |
| InP Ridge Etch: INSERT ETCH PARAMS (IPC< Pressure, gasses etc.) | |||||
| Date | Sample# | Etch Rate (nm/min) | Etch Selectivity (InP/SiO2) | Comments | SEM Images |
| 2022-01-11 | Software timing bugs fixed - new etch rate appears slightly higher. | [1] (wrong) | |||
| 2022-01-11 | [2] (wrong) | ||||
| 2022-01-21 | [3] (wrong) | ||||