Difference between revisions of "PECVD 2 (Advanced Vacuum)"
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==About== | ==About== | ||
| − | This open-load system is dedicated to PECVD of SiO<sub>2</sub>, SiN<sub>x</sub>, SiO<sub>x</sub>N<sub>y</sub>, and a-Si using Silane (2%SiH<sub>4</sub>, 98% He), N<sub>2</sub>O, NH<sub>3</sub>, and N<sub>2</sub> gases. The sample electrode has a 270mm diameter useable area, allowing for multiple 4” wafer depositions in a single run. Standard operating temperature is 300C, but can be user changed for temps ranging anywhere from 250 to 350C. The system is equipped with a dual generator, dual frequency option for growth of | + | * '''Films/Gases''': This open-load system is dedicated to PECVD of '''SiO<sub>2</sub>, SiN<sub>x</sub>, SiO<sub>x</sub>N<sub>y</sub>, and a-Si''' using Silane (2%SiH<sub>4</sub>, 98% He), N<sub>2</sub>O, NH<sub>3</sub>, and N<sub>2</sub> gases. |
| + | * '''Size''': The sample electrode has a 270mm diameter useable area, allowing for multiple 4” wafer depositions in a single run. | ||
| + | * '''Temperature''': Standard operating temperature is 300C, but can be user changed for temps ranging anywhere from 250 to 350C. | ||
| + | * '''Low-Stress Si<sub>3</sub>N<sub>4</sub>''': The system is equipped with a dual generator, dual frequency option for growth of Low-stress Nitride films. The Low-Stress Si3N4 film recipe are tested approx. monthly, and kept within ±100MPa. | ||
==See Also== | ==See Also== | ||
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*[http://www.advanced-vacuum.se/Ny-sida-8.html Vision 310 Product Page] | *[http://www.advanced-vacuum.se/Ny-sida-8.html Vision 310 Product Page] | ||
| − | == Documentation | + | ==Documentation== |
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| − | * Recipes can be found on the PECVD Recipes Page: | + | * |
| − | ** [[PECVD Recipes#PECVD 2 .28Advanced Vacuum.29|Recipes > Vacuum Deposition Recipes > PECVD Recipes > '''<u>PECVD 2 - Advanced Vacuum</u>''']] | + | * |
| − | ** Thin-Films recorded: SiO2, Si3N4 and Low-Stress Si3N4 | + | * |
| − | ** ''Historical (Process Control) Data is also shown here.'' | + | * |
| − | * A list of ''all available'' deposited films can be found on the Vacuum Deposition Recipes page: | + | * |
| − | ** [[Vacuum Deposition Recipes|Recipes > Vacuum Deposition Recipes]] | + | * |
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| + | *[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions] | ||
| + | *[[Wafer Coating Process Traveler]] | ||
| + | *For particle counting method, see the [[Wafer scanning process traveler|Surfscan Scanning Procedure]] | ||
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| + | ==Recipes & Historical Data== | ||
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| + | *Recipes can be found on the PECVD Recipes Page: | ||
| + | **[[PECVD Recipes#PECVD 2 .28Advanced Vacuum.29|Recipes > Vacuum Deposition Recipes > PECVD Recipes > '''<u>PECVD 2 - Advanced Vacuum</u>''']] | ||
| + | **Thin-Films recorded: SiO2, Si3N4 and Low-Stress Si3N4 | ||
| + | **''Historical (Process Control) Data is also shown here.'' | ||
| + | *A list of ''all available'' deposited films can be found on the Vacuum Deposition Recipes page: | ||
| + | **[[Vacuum Deposition Recipes|Recipes > Vacuum Deposition Recipes]] | ||
Revision as of 11:03, 4 November 2021
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About
- Films/Gases: This open-load system is dedicated to PECVD of SiO2, SiNx, SiOxNy, and a-Si using Silane (2%SiH4, 98% He), N2O, NH3, and N2 gases.
- Size: The sample electrode has a 270mm diameter useable area, allowing for multiple 4” wafer depositions in a single run.
- Temperature: Standard operating temperature is 300C, but can be user changed for temps ranging anywhere from 250 to 350C.
- Low-Stress Si3N4: The system is equipped with a dual generator, dual frequency option for growth of Low-stress Nitride films. The Low-Stress Si3N4 film recipe are tested approx. monthly, and kept within ±100MPa.
See Also
Documentation
- Operating Instructions
- Wafer Coating Process Traveler
- For particle counting method, see the Surfscan Scanning Procedure
Recipes & Historical Data
- Recipes can be found on the PECVD Recipes Page:
- Recipes > Vacuum Deposition Recipes > PECVD Recipes > PECVD 2 - Advanced Vacuum
- Thin-Films recorded: SiO2, Si3N4 and Low-Stress Si3N4
- Historical (Process Control) Data is also shown here.
- A list of all available deposited films can be found on the Vacuum Deposition Recipes page: