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- 09:43, 18 May 2022 diff hist +247 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher still a low etch rate on new fl cal Tag: Visual edit
- 09:41, 18 May 2022 diff hist 0 N File:SiO2 Fl 10 CS 007.jpg current
- 09:41, 18 May 2022 diff hist 0 N File:SiO2 Fl 10 45D-003.jpg current
- 09:48, 12 May 2022 diff hist +186 m Oxford ICP Etcher - Process Control Data added new cal to oxford 60c Tag: Visual edit
- 09:47, 12 May 2022 diff hist 0 N File:Oxford 60c 10 CS 008.jpg current
- 09:47, 12 May 2022 diff hist 0 N File:Oxford 60c 10 45D 003.jpg current
- 08:02, 12 May 2022 diff hist +39 m Oxford ICP Etcher - Process Control Data started to enter new cal on oxford60c Tag: Visual edit
- 09:36, 11 May 2022 diff hist +16 m Test Data of etching SiO2 with CHF3/CF4 added selectivity to ICP2 cals Tag: Visual edit
- 09:33, 11 May 2022 diff hist +241 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher addded entry to fl cals, added selectivity. etch rate is 10% lower Tag: Visual edit
- 09:28, 11 May 2022 diff hist 0 N File:SiO2 Fl 09 CS 006.jpg current
- 09:28, 11 May 2022 diff hist 0 N File:SiO2 Fl 09 45D 005.jpg current
- 09:24, 11 May 2022 diff hist +227 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry in ICP1 cals, added selectivity Tag: Visual edit
- 09:20, 11 May 2022 diff hist 0 N File:ICP1 07 CS 006.jpg current
- 09:20, 11 May 2022 diff hist 0 N File:ICP1 07 45D 008.jpg current
- 07:58, 10 May 2022 diff hist 0 m Test Data of etching SiO2 with CHF3/CF4 fixed typo on icp2 cals Tag: Visual edit
- 11:01, 5 May 2022 diff hist +233 m Oxford ICP Etcher - Process Control Data added new entry to oxford 60c cal Tag: Visual edit
- 10:59, 5 May 2022 diff hist 0 N File:InP Oxford 60c 09 CS 005.jpg current
- 10:59, 5 May 2022 diff hist 0 N File:InP Oxford 60c 09 45D 005.jpg current
- 10:53, 5 May 2022 diff hist +264 Test Data of etching SiO2 with CHF3/CF4 Added new entry to ICP2 cals -- after chuck temperature was lowered Tag: Visual edit
- 10:51, 5 May 2022 diff hist 0 N File:ICP2 07 CS 005.jpg current
- 10:50, 5 May 2022 diff hist 0 N File:ICP2 07 45D 002.jpg current
- 08:09, 4 May 2022 diff hist +220 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher added entry to FL cals Tag: Visual edit
- 08:08, 4 May 2022 diff hist 0 N File:SiO2 Fl 08 CS 005.jpg current
- 08:07, 4 May 2022 diff hist 0 N File:SiO2 Fl 08 45D 004.jpg current
- 13:15, 28 April 2022 diff hist +220 m Unaxis VLR Etch - Process Control Data added new entry to unaxis cals Tag: Visual edit
- 13:13, 28 April 2022 diff hist 0 N File:Unaxis 03 CS 003.jpg current
- 13:12, 28 April 2022 diff hist 0 N File:Unaxis 03 45D 003.jpg current
- 13:09, 28 April 2022 diff hist +202 m Oxford ICP Etcher - Process Control Data added entry to Oxford 60c cals Tag: Visual edit
- 13:04, 28 April 2022 diff hist 0 N File:Oxford 60c 08 CS 009.jpg current
- 13:04, 28 April 2022 diff hist 0 N File:Oxford 60c 08 45D 003.jpg current
- 10:08, 27 April 2022 diff hist +3,202 m Unaxis VLR Etch - Process Control Data merged the two sets of ICP cal data Tag: Visual edit
- 12:32, 26 April 2022 diff hist +299 m Oxford ICP Etcher - Process Control Data added new entry to oxford 60c cal Tag: Visual edit
- 12:31, 26 April 2022 diff hist 0 N File:Oxford 60c 07 CS 001.jpg current
- 12:30, 26 April 2022 diff hist 0 N File:Oxford 60c 07 45D 002.jpg current
- 12:27, 26 April 2022 diff hist +215 m Test Data of etching SiO2 with CHF3/CF4 added new entry to ICP2 cals Tag: Visual edit
- 12:26, 26 April 2022 diff hist 0 N File:ICP2 06 CS 001.jpg current
- 12:26, 26 April 2022 diff hist 0 N File:ICP2 06 45D 002.jpg current
- 12:24, 26 April 2022 diff hist +213 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry to ICP1 cals Tag: Visual edit
- 12:23, 26 April 2022 diff hist 0 N File:ICP1 06 CS 002.jpg current
- 12:22, 26 April 2022 diff hist 0 N File:ICP1 06 45D 002.jpg current
- 10:20, 21 April 2022 diff hist +13 m Unaxis VLR Etch - Process Control Data edited recipe on Unaxis Process control data Tag: Visual edit
- 10:17, 21 April 2022 diff hist +3 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher fixed typo Tag: Visual edit
- 10:09, 21 April 2022 diff hist +219 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher added entry to FL cals Tag: Visual edit
- 10:08, 21 April 2022 diff hist 0 N File:SiO2 Fl 07 CS 004.jpg current
- 10:07, 21 April 2022 diff hist 0 N File:SiO2 Fl 07 45D 003.jpg current
- 10:02, 21 April 2022 diff hist +210 m Test Data of etching SiO2 with CHF3/CF4 added new entry to ICP2 cals Tag: Visual edit
- 10:01, 21 April 2022 diff hist 0 N File:ICP2 05 CS 001.jpg current
- 10:00, 21 April 2022 diff hist 0 N File:ICP2 05 45D 003.jpg current
- 09:58, 21 April 2022 diff hist +211 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry to ICP1 cals Tag: Visual edit
- 09:57, 21 April 2022 diff hist 0 N File:ICP1 05 CS 002.jpg current
- 09:56, 21 April 2022 diff hist 0 N File:ICP1 05 45D 001.jpg current
- 10:36, 20 April 2022 diff hist -19 m Unaxis VLR Etch - Process Control Data started to enter etch recipe in to cal table Tag: Visual edit
- 10:34, 20 April 2022 diff hist +382 m Unaxis VLR Etch - Process Control Data added new entries for Unaxis cals Tag: Visual edit
- 10:33, 20 April 2022 diff hist 0 N File:Unaxis 02 CS 002.jpg current
- 10:30, 20 April 2022 diff hist 0 N File:Unaxis 02 CS 004.jpg current
- 10:30, 20 April 2022 diff hist 0 N File:Unaxis 02 45D 002.jpg current
- 10:29, 20 April 2022 diff hist 0 N File:Unaxis 01 45D 002.jpg current
- 10:29, 20 April 2022 diff hist 0 N File:Unaxis 01 CS 001.jpg current
- 10:19, 20 April 2022 diff hist +325 m Oxford ICP Etcher - Process Control Data added entry in Oxford 60c cals Tag: Visual edit
- 10:17, 20 April 2022 diff hist 0 N File:Oxford 60c 06 45D 002.jpg current
- 10:16, 20 April 2022 diff hist 0 N File:Oxford 60c 06 CS 005.jpg current
- 10:14, 20 April 2022 diff hist -8 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher new SEM on SiO2_Fl_03 Tag: Visual edit
- 10:12, 20 April 2022 diff hist 0 N File:SiO2 Fl 03 CS 004.jpg current
- 11:58, 19 April 2022 diff hist +242 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher added entry to Fl cals Tag: Visual edit
- 11:56, 19 April 2022 diff hist 0 N File:SiO2 Fl 06 CS 002.jpg current
- 11:56, 19 April 2022 diff hist 0 N File:SiO2 Fl 06 45D 002.jpg current
- 11:52, 19 April 2022 diff hist +207 m Oxford ICP Etcher - Process Control Data added entry in Oxford, updated selectivity numbers Tag: Visual edit
- 11:48, 19 April 2022 diff hist 0 N File:Oxford 60c 05 CS 002.jpg current
- 11:48, 19 April 2022 diff hist 0 N File:Oxford 60c 05 45D 004.jpg current
- 09:32, 14 April 2022 diff hist +216 m Test Data of etching SiO2 with CHF3/CF4 added entry to ICP2 cals Tag: Visual edit
- 09:30, 14 April 2022 diff hist 0 N File:ICP2 004 CS 003.jpg current
- 09:29, 14 April 2022 diff hist 0 N File:ICP2 004 45D 001.jpg current
- 09:26, 14 April 2022 diff hist +215 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry in ICP1 cals Tag: Visual edit
- 09:25, 14 April 2022 diff hist 0 N File:ICP1 004 CS 001.jpg current
- 09:25, 14 April 2022 diff hist 0 N File:ICP1 004 45D 004.jpg current
- 12:22, 13 April 2022 diff hist -3 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher made more recent cals on top for Fl Etcher Tag: Visual edit
- 12:20, 13 April 2022 diff hist 0 m Oxford ICP Etcher - Process Control Data made more recent cals on top of table for Oxford Tag: Visual edit
- 12:16, 13 April 2022 diff hist 0 m Test Data of etching SiO2 with CHF3/CF4 made more recent cals on top of table for ICP2 Tag: Visual edit
- 12:14, 13 April 2022 diff hist +2 m Test Data of etching SiO2 with CHF3/CF4-ICP1 made more recent cals on top of table for iCP1 Tag: Visual edit
- 10:16, 12 April 2022 diff hist +17 m Oxford ICP Etcher - Process Control Data added comment Tag: Visual edit
- 07:46, 31 March 2022 diff hist +225 m Oxford ICP Etcher - Process Control Data added entry to oxford 60c cals Tag: Visual edit
- 07:45, 31 March 2022 diff hist 0 N File:Oxford 60c 04 CS 004.jpg current
- 07:44, 31 March 2022 diff hist 0 N File:Oxford 60c 04 45D 001.jpg current
- 09:29, 30 March 2022 diff hist +238 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher added entry in Fl Etcher, added selectivity to recent Cals Tag: Visual edit
- 09:26, 30 March 2022 diff hist 0 N File:SiO2 Fl 05 CS 002.jpg current
- 09:25, 30 March 2022 diff hist 0 N File:SiO2 Fl 03 45D 002.jpg current
- 09:16, 30 March 2022 diff hist +223 m Test Data of etching SiO2 with CHF3/CF4 added entry to ICP2, added selectivity for recent cals Tag: Visual edit
- 09:16, 30 March 2022 diff hist 0 N File:ICP2 03 45D 002.jpg current
- 09:15, 30 March 2022 diff hist 0 N File:ICP2 03 CS 003.jpg current
- 09:09, 30 March 2022 diff hist +12 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added selectivity to recent ICP1 cals Tag: Visual edit
- 09:03, 30 March 2022 diff hist +212 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry in ICP1 Tag: Visual edit
- 09:02, 30 March 2022 diff hist 0 N File:ICP1 03 CS 005.jpg current
- 09:01, 30 March 2022 diff hist 0 N File:ICP1 03 45D 002.jpg current
- 09:42, 9 March 2022 diff hist +210 m Test Data of etching SiO2 with CHF3/CF4 added entry to ICP2 historical data Tag: Visual edit
- 09:42, 9 March 2022 diff hist 0 N File:ICP2 02 CS 004.jpg current
- 09:41, 9 March 2022 diff hist 0 N File:ICP2 02 45D 001.jpg current
- 09:39, 9 March 2022 diff hist +212 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry to ICP1 historical data Tag: Visual edit
- 09:38, 9 March 2022 diff hist 0 N File:ICP1 02 CS 002.jpg current
- 09:38, 9 March 2022 diff hist 0 N File:ICP1 02 45D 001.jpg current
- 09:35, 9 March 2022 diff hist +455 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher added entry to Fl historical data (wiht new table for 90s cals) Tag: Visual edit
