User contributions for Pakala

18 May 2022

• 17:4317:43, 18 May 2022 diff hist +247‎ m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher ‎ still a low etch rate on new fl cal Tag: Visual edit
• 17:4117:41, 18 May 2022 diff hist 0‎ N File:SiO2 Fl 10 CS 007.jpg ‎No edit summary current
• 17:4117:41, 18 May 2022 diff hist 0‎ N File:SiO2 Fl 10 45D-003.jpg ‎No edit summary current

12 May 2022

• 17:4817:48, 12 May 2022 diff hist +186‎ m Oxford ICP Etcher - Process Control Data ‎ added new cal to oxford 60c Tag: Visual edit
• 17:4717:47, 12 May 2022 diff hist 0‎ N File:Oxford 60c 10 CS 008.jpg ‎No edit summary current
• 17:4717:47, 12 May 2022 diff hist 0‎ N File:Oxford 60c 10 45D 003.jpg ‎No edit summary current
• 16:0216:02, 12 May 2022 diff hist +39‎ m Oxford ICP Etcher - Process Control Data ‎ started to enter new cal on oxford60c Tag: Visual edit

11 May 2022

• 17:3617:36, 11 May 2022 diff hist +16‎ m Test Data of etching SiO2 with CHF3/CF4 ‎ added selectivity to ICP2 cals Tag: Visual edit
• 17:3317:33, 11 May 2022 diff hist +241‎ m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher ‎ addded entry to fl cals, added selectivity. etch rate is 10% lower Tag: Visual edit
• 17:2817:28, 11 May 2022 diff hist 0‎ N File:SiO2 Fl 09 CS 006.jpg ‎No edit summary current
• 17:2817:28, 11 May 2022 diff hist 0‎ N File:SiO2 Fl 09 45D 005.jpg ‎No edit summary current
• 17:2417:24, 11 May 2022 diff hist +227‎ m Test Data of etching SiO2 with CHF3/CF4-ICP1 ‎ added entry in ICP1 cals, added selectivity Tag: Visual edit
• 17:2017:20, 11 May 2022 diff hist 0‎ N File:ICP1 07 CS 006.jpg ‎No edit summary current
• 17:2017:20, 11 May 2022 diff hist 0‎ N File:ICP1 07 45D 008.jpg ‎No edit summary current

10 May 2022

• 15:5815:58, 10 May 2022 diff hist 0‎ m Test Data of etching SiO2 with CHF3/CF4 ‎ fixed typo on icp2 cals Tag: Visual edit

5 May 2022

• 19:0119:01, 5 May 2022 diff hist +233‎ m Oxford ICP Etcher - Process Control Data ‎ added new entry to oxford 60c cal Tag: Visual edit
• 18:5918:59, 5 May 2022 diff hist 0‎ N File:InP Oxford 60c 09 CS 005.jpg ‎No edit summary current
• 18:5918:59, 5 May 2022 diff hist 0‎ N File:InP Oxford 60c 09 45D 005.jpg ‎No edit summary current
• 18:5318:53, 5 May 2022 diff hist +264‎ Test Data of etching SiO2 with CHF3/CF4 ‎ Added new entry to ICP2 cals -- after chuck temperature was lowered Tag: Visual edit
• 18:5118:51, 5 May 2022 diff hist 0‎ N File:ICP2 07 CS 005.jpg ‎No edit summary current
• 18:5018:50, 5 May 2022 diff hist 0‎ N File:ICP2 07 45D 002.jpg ‎No edit summary current

4 May 2022

• 16:0916:09, 4 May 2022 diff hist +220‎ m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher ‎ added entry to FL cals Tag: Visual edit
• 16:0816:08, 4 May 2022 diff hist 0‎ N File:SiO2 Fl 08 CS 005.jpg ‎No edit summary current
• 16:0716:07, 4 May 2022 diff hist 0‎ N File:SiO2 Fl 08 45D 004.jpg ‎No edit summary current

28 April 2022

• 21:1521:15, 28 April 2022 diff hist +220‎ m Unaxis VLR Etch - Process Control Data ‎ added new entry to unaxis cals Tag: Visual edit
• 21:1321:13, 28 April 2022 diff hist 0‎ N File:Unaxis 03 CS 003.jpg ‎No edit summary current
• 21:1221:12, 28 April 2022 diff hist 0‎ N File:Unaxis 03 45D 003.jpg ‎No edit summary current
• 21:0921:09, 28 April 2022 diff hist +202‎ m Oxford ICP Etcher - Process Control Data ‎ added entry to Oxford 60c cals Tag: Visual edit
• 21:0421:04, 28 April 2022 diff hist 0‎ N File:Oxford 60c 08 CS 009.jpg ‎No edit summary current
• 21:0421:04, 28 April 2022 diff hist 0‎ N File:Oxford 60c 08 45D 003.jpg ‎No edit summary current

27 April 2022

• 18:0818:08, 27 April 2022 diff hist +3,202‎ m Unaxis VLR Etch - Process Control Data ‎ merged the two sets of ICP cal data Tag: Visual edit

26 April 2022

• 20:3220:32, 26 April 2022 diff hist +299‎ m Oxford ICP Etcher - Process Control Data ‎ added new entry to oxford 60c cal Tag: Visual edit
• 20:3120:31, 26 April 2022 diff hist 0‎ N File:Oxford 60c 07 CS 001.jpg ‎No edit summary current
• 20:3020:30, 26 April 2022 diff hist 0‎ N File:Oxford 60c 07 45D 002.jpg ‎No edit summary current
• 20:2720:27, 26 April 2022 diff hist +215‎ m Test Data of etching SiO2 with CHF3/CF4 ‎ added new entry to ICP2 cals Tag: Visual edit
• 20:2620:26, 26 April 2022 diff hist 0‎ N File:ICP2 06 CS 001.jpg ‎No edit summary current
• 20:2620:26, 26 April 2022 diff hist 0‎ N File:ICP2 06 45D 002.jpg ‎No edit summary current
• 20:2420:24, 26 April 2022 diff hist +213‎ m Test Data of etching SiO2 with CHF3/CF4-ICP1 ‎ added entry to ICP1 cals Tag: Visual edit
• 20:2320:23, 26 April 2022 diff hist 0‎ N File:ICP1 06 CS 002.jpg ‎No edit summary current
• 20:2220:22, 26 April 2022 diff hist 0‎ N File:ICP1 06 45D 002.jpg ‎No edit summary current

21 April 2022

• 18:2018:20, 21 April 2022 diff hist +13‎ m Unaxis VLR Etch - Process Control Data ‎ edited recipe on Unaxis Process control data Tag: Visual edit
• 18:1718:17, 21 April 2022 diff hist +3‎ m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher ‎ fixed typo Tag: Visual edit
• 18:0918:09, 21 April 2022 diff hist +219‎ m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher ‎ added entry to FL cals Tag: Visual edit
• 18:0818:08, 21 April 2022 diff hist 0‎ N File:SiO2 Fl 07 CS 004.jpg ‎No edit summary current
• 18:0718:07, 21 April 2022 diff hist 0‎ N File:SiO2 Fl 07 45D 003.jpg ‎No edit summary current
• 18:0218:02, 21 April 2022 diff hist +210‎ m Test Data of etching SiO2 with CHF3/CF4 ‎ added new entry to ICP2 cals Tag: Visual edit
• 18:0118:01, 21 April 2022 diff hist 0‎ N File:ICP2 05 CS 001.jpg ‎No edit summary current
• 18:0018:00, 21 April 2022 diff hist 0‎ N File:ICP2 05 45D 003.jpg ‎No edit summary current
• 17:5817:58, 21 April 2022 diff hist +211‎ m Test Data of etching SiO2 with CHF3/CF4-ICP1 ‎ added entry to ICP1 cals Tag: Visual edit
• 17:5717:57, 21 April 2022 diff hist 0‎ N File:ICP1 05 CS 002.jpg ‎No edit summary current