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- 09:43, 18 May 2022 diff hist +247 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher still a low etch rate on new fl cal Tag: Visual edit
- 09:41, 18 May 2022 diff hist 0 N File:SiO2 Fl 10 CS 007.jpg current
- 09:41, 18 May 2022 diff hist 0 N File:SiO2 Fl 10 45D-003.jpg current
- 09:48, 12 May 2022 diff hist +186 m Oxford ICP Etcher - Process Control Data added new cal to oxford 60c Tag: Visual edit
- 09:47, 12 May 2022 diff hist 0 N File:Oxford 60c 10 CS 008.jpg current
- 09:47, 12 May 2022 diff hist 0 N File:Oxford 60c 10 45D 003.jpg current
- 08:02, 12 May 2022 diff hist +39 m Oxford ICP Etcher - Process Control Data started to enter new cal on oxford60c Tag: Visual edit
- 09:36, 11 May 2022 diff hist +16 m Test Data of etching SiO2 with CHF3/CF4 added selectivity to ICP2 cals Tag: Visual edit
- 09:33, 11 May 2022 diff hist +241 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher addded entry to fl cals, added selectivity. etch rate is 10% lower Tag: Visual edit
- 09:28, 11 May 2022 diff hist 0 N File:SiO2 Fl 09 CS 006.jpg current
- 09:28, 11 May 2022 diff hist 0 N File:SiO2 Fl 09 45D 005.jpg current
- 09:24, 11 May 2022 diff hist +227 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry in ICP1 cals, added selectivity Tag: Visual edit
- 09:20, 11 May 2022 diff hist 0 N File:ICP1 07 CS 006.jpg current
- 09:20, 11 May 2022 diff hist 0 N File:ICP1 07 45D 008.jpg current
- 07:58, 10 May 2022 diff hist 0 m Test Data of etching SiO2 with CHF3/CF4 fixed typo on icp2 cals Tag: Visual edit
- 11:01, 5 May 2022 diff hist +233 m Oxford ICP Etcher - Process Control Data added new entry to oxford 60c cal Tag: Visual edit
- 10:59, 5 May 2022 diff hist 0 N File:InP Oxford 60c 09 CS 005.jpg current
- 10:59, 5 May 2022 diff hist 0 N File:InP Oxford 60c 09 45D 005.jpg current
- 10:53, 5 May 2022 diff hist +264 Test Data of etching SiO2 with CHF3/CF4 Added new entry to ICP2 cals -- after chuck temperature was lowered Tag: Visual edit
- 10:51, 5 May 2022 diff hist 0 N File:ICP2 07 CS 005.jpg current
