Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer)"
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|79.4 |
|79.4 |
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|[https://www.nanotech.ucsb.edu/wiki/images/d/dc/SiO2_Etch_using_ICP2_with_O2-3-06-2019.pdf] |
|[https://www.nanotech.ucsb.edu/wiki/images/d/dc/SiO2_Etch_using_ICP2_with_O2-3-06-2019.pdf] |
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+ | |7/12/2019 |
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+ | |I21906 |
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+ | |91.9 |
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+ | |0.69 |
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+ | |78.1 |
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