Holographic Lith/PL Setup (Custom)

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Holographic Lith/PL Setup (Custom)
Tool Type Lithography
Location Bay 6
Supervisor Demis D. John
Supervisor Phone (805) 893-5934
Supervisor E-Mail demis@ucsb.edu
Description Custom Interference Lithography
Manufacturer Custom-Built Free-Space Optics
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The interference lithography system (aka. Holography) at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area.

XHRiC bottom anti-reflection coating (BARC) & THMR-3600HP imaging resist spin-coated to ~80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length.

A photoluminescence measurement setup is co-located on the optical table. Please see the page for the PL system for more info:

Detailed Specifications

  • 15 mW single TEM mode HeCd laser (Kimmon)
  • Max sample size: ~1.5 inch square uniform exposure area
  • ~2 cm x 2 cm uniform exposure area
  • Several-minute exposure times (manual shutter)
  • Grating period adjustable from ~200 to ~280 nm with rotation stage
  • Manual optics alignment.
  • 1-D and 2-D gratings possible, see recipes below.