E-Beam Lithography Recipes
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Contact Aligners
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Steppers
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Flood Expose
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E-Beam Lithography
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| Positive Resists
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SUSS MJB-3
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SUSS MA-6
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Stepper 1
(GCA 6300)
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Stepper 2
(AutoStep 200)
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Stepper 3
(ASML DUV)
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DUV Flood
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Field Emission SEM 1
(FEI Sirion)
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E-Beam Lithography System
(JEOL JBX-6300FS)
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| AZ4110
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R1
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R1
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A
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A
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| AZ4210
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R1
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R1
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A
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A
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| AZ4330RS
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R1
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R1
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A
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A
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| OCG 825-35CS
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A
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A
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A
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A
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| SPR 950-0.8
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A
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A
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A
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A
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| SPR 955 CM-0.9
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A
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A
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R1
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R1
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| SPR 955 CM-1.8
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A
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A
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R1
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R1
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| SPR 220-3.0
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R1
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R1
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R1
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R1
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| SPR 220-7.0
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R1
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R1
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R1
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R1
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| THMR-IP3600 HP D
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A
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A
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| UV6-0.7
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R1
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| UV210-0.3
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R1
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| Negative Resists
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SUSS MJB-3
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SUSS MA-6
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Stepper 1
(GCA 6300)
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Stepper 2
(AutoStep 200)
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Stepper 3
(ASML DUV)
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DUV Flood
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Field Emission SEM 1
(FEI Sirion)
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E-Beam Lithography System
(JEOL JBX-6300FS)
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| AZ5214-EIR
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R1
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R1
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R1
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R1
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| AZnLOF 2020
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R1
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R1
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R1
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R1
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| AZnLOF 2035
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A
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A
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A
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A
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| AZnLOF 2070
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A
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A
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A
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A
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| AZnLOF 5510
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A
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A
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R1
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R1
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| UVN2300-0.5
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R1
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| SU-8 2015
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A
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A
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A
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A
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| Underlayers
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SUSS MJB-3
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SUSS MA-6
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Stepper 1
(GCA 6300)
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Stepper 2
(AutoStep 200)
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Stepper 3
(ASML DUV)
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DUV Flood
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Field Emission SEM 1
(FEI Sirion)
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E-Beam Lithography System
(JEOL JBX-6300FS)
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| PMGI SF-11
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| PMGI SF-15
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| LOL 2000
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| XHRIC-11 (i-lineBARC)
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| AR-2 (DUV BARC)
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| DS-K101 (DUV BARC)
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| Overlayers
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SUSS MJB-3
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SUSS MA-6
|
Stepper 1
(GCA 6300)
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Stepper 2
(AutoStep 200)
|
Stepper 3
(ASML DUV)
|
DUV Flood
|
Field Emission SEM 1
(FEI Sirion)
|
E-Beam Lithography System
(JEOL JBX-6300FS)
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| CEM-365 IS
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| E-Beam Resists
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SUSS MJB-3
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SUSS MA-6
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Stepper 1
(GCA 6300)
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Stepper 2
(AutoStep 200)
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Stepper 3
(ASML DUV)
|
DUV Flood
|
Field Emission SEM 1
(FEI Sirion)
|
E-Beam Lithography System
(JEOL JBX-6300FS)
|
| ??????
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| ???????
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| Nanoimprint Resists
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SUSS MJB-3
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SUSS MA-6
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Stepper 1
(GCA 6300)
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Stepper 2
(AutoStep 200)
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Stepper 3
(ASML DUV)
|
DUV Flood
|
Field Emission SEM 1
(FEI Sirion)
|
E-Beam Lithography System
(JEOL JBX-6300FS)
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| MR-I 7020
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| Nanonex NX-1020
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SUSS MJB-3
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SUSS MA-6
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Stepper 1
(GCA 6300)
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Stepper 2
(AutoStep 200)
|
Stepper 3
(ASML DUV)
|
DUV Flood
|
Field Emission SEM 1
(FEI Sirion)
|
E-Beam Lithography System
(JEOL JBX-6300FS)
|