User contributions for Noahdutra

12 August 2025

• 23:5523:55, 12 August 2025 diff hist +124 Process Group - Process Control Data →NEW Std InP Ridge Etch Cl2/H2/Ar/200°C current
• 23:5423:54, 12 August 2025 diff hist −129 Process Group - Process Control Data →NEW Std InP Ridge Etch Cl2/H2/Ar/200°C Tag: Visual edit
• 23:5323:53, 12 August 2025 diff hist +969 Process Group - Process Control Data →InP Ridge Etch: Cl2/CH4/H2/60°C: adding 200C InP for OXFD Tag: Visual edit
• 23:5123:51, 12 August 2025 diff hist 0 ICP Etching Recipes →Process Control Data (Oxford ICP Etcher) Tag: Visual edit
• 23:4823:48, 12 August 2025 diff hist +124 ICP Etching Recipes →Process Control Data (Oxford ICP Etcher)
• 23:4523:45, 12 August 2025 diff hist +18 ICP Etching Recipes →Process Control Data (Oxford ICP Etcher) Tag: Visual edit
• 23:4423:44, 12 August 2025 diff hist −131 ICP Etching Recipes →Process Control Data (Oxford ICP Etcher): added more 200C info Tag: Visual edit
• 23:4123:41, 12 August 2025 diff hist 0 N File:200C InP.png No edit summary current
• 23:4123:41, 12 August 2025 diff hist +1,566 ICP Etching Recipes →Low-Temp (60°C) Process: Adding 200C InP Tag: Visual edit
• 17:5817:58, 12 August 2025 diff hist 0 Dry Etching Recipes updating FICP to have W and TiW to R3 current Tag: Visual edit
• 17:5617:56, 12 August 2025 diff hist 0 Vacuum Deposition Recipes Demoted IBD AlO and TiO to R3 which is correct ranking due to not >= 4 data per year current Tag: Visual edit
• 17:0917:09, 12 August 2025 diff hist 0 Vacuum Deposition Recipes Bringing Sputter 5 Ti, Al, Cr to R5 (once the details are put on the wiki, we will update these all to R6) Tag: Visual edit
• 16:5416:54, 12 August 2025 diff hist 0 Vacuum Deposition Recipes Updating Ti, Au, Cr, Ni to R6 for Ebeam1 Tag: Visual edit
• 16:3816:38, 12 August 2025 diff hist 0 Dry Etching Recipes GaAs etch on OXFD Cobra to R3 Tag: Visual edit
• 16:3216:32, 12 August 2025 diff hist 0 Vacuum Deposition Recipes updating Ebeam1 rankings Tag: Visual edit

24 July 2025

• 17:2017:20, 24 July 2025 diff hist +111 Vacuum Deposition Recipes added PECVD2 3xtime "R6" to table Tag: Visual edit
• 17:1417:14, 24 July 2025 diff hist +122 SEM 1 (JEOL IT800SHL) →Operating Procedures: Added CalTech Resource on SEM imaging concepts in "operating procedures" section at bottom of page current Tag: Visual edit

23 July 2025

• 00:1100:11, 23 July 2025 diff hist +1 Process Group Interns edited intern dates current Tag: Visual edit

18 July 2025

• 23:1923:19, 18 July 2025 diff hist +110 Process Group Interns →Alumni: Updated Interns Tag: Visual edit

15 July 2025

• 21:4821:48, 15 July 2025 diff hist −27 Noah Dutra →About: Changed About slightly current Tag: Visual edit

5 March 2025

• 17:4417:44, 5 March 2025 diff hist 0 Dry Etching Recipes Added R6 for GaAs etch on ICP2 Tag: Visual edit

6 February 2025

• 01:1601:16, 6 February 2025 diff hist −62 Noah Dutra No edit summary Tag: Visual edit

20 December 2024

• 17:0617:06, 20 December 2024 diff hist +63 Noah Dutra →About: Added "About" Section Tag: Visual edit

27 November 2024

• 23:0423:04, 27 November 2024 diff hist +46 Oxford ICP Etcher (PlasmaPro 100 Cobra) →GaN Etch (Cl2/BCl3/Ar/200°C): Added recipe name for GaN current Tag: Visual edit
• 23:0323:03, 27 November 2024 diff hist +46 ICP Etching Recipes →Process Control Data for "GaN Etch" (Cl2/BCl3/Ar/200°C): Added recipe name for GaN Tag: Visual edit
• 22:5722:57, 27 November 2024 diff hist +46 Process Group - Process Control Data →GaN Etch (Cl2/BCl3/Ar/200°C): Added recipe name for public GaN etch Tag: Visual edit
• 21:2921:29, 27 November 2024 diff hist +128 ICP Etching Recipes →Si Etching (Fluorine ICP Etcher): Added Image Tag: Visual edit
• 21:2521:25, 27 November 2024 diff hist +42 N File:Dot Facet 00.jpg GaN etch, credit: Gopi Meena current
• 21:2321:23, 27 November 2024 diff hist +511 ICP Etching Recipes →Process Control Data for "GaN Etch" (Cl2/BCl3/Ar/200°C): Added GaN Tag: Visual edit
• 21:2221:22, 27 November 2024 diff hist +509 Oxford ICP Etcher (PlasmaPro 100 Cobra) →GaN Etch (Cl2/BCl3/Ar/200°C) Tag: Visual edit
• 21:2021:20, 27 November 2024 diff hist −102 Process Group - Process Control Data →GaN Etch (Cl2/BCl3/Ar/200°C) Tag: Visual edit
• 21:1921:19, 27 November 2024 diff hist +170 Process Group - Process Control Data →GaN Etch (Cl2/BCl3/Ar/200°C)
• 21:1021:10, 27 November 2024 diff hist +465 Process Group - Process Control Data →GaN Etch (Cl2/BCl3/Ar/200°C): Added things to GaN etch SPC Tag: Visual edit
• 21:0221:02, 27 November 2024 diff hist +48 N File:GaN SPC.png GaN SPC chart for etch cal on OXFD current
• 20:4820:48, 27 November 2024 diff hist 0 Dry Etching Recipes changed OXFD GaN etch to R6 Tag: Visual edit

7 November 2024

• 21:5721:57, 7 November 2024 diff hist +94 Vacuum Deposition Recipes Added AuSn to Thermal evap 2 Tag: Visual edit
• 21:4921:49, 7 November 2024 diff hist −2,440 Vacuum Deposition Recipes changing thermal evaps to be correct Tag: Visual edit

30 October 2024

• 23:5823:58, 30 October 2024 diff hist −55 Vacuum Deposition Recipes No edit summary Tag: Visual edit

22 October 2024

• 00:4100:41, 22 October 2024 diff hist 0 Dry Etching Recipes Changed FICP Si to R6 and OXFD GaN to R3 Tag: Visual edit

9 October 2024

• 23:3923:39, 9 October 2024 diff hist −30 ICP Etching Recipes →Process Control Data (DSEiii): took off SiO2/Al2O3 selectivity for dse Tag: Visual edit

8 October 2024

• 21:2921:29, 8 October 2024 diff hist −1 ICP Etching Recipes →Process Control Data (DSEiii): more details for the etch Tag: Visual edit
• 21:0321:03, 8 October 2024 diff hist +52 N File:Cal DSE Ar+ER.png DSE STD_Bosch_Si etch AR/ER dependence current
• 21:0121:01, 8 October 2024 diff hist +124 ICP Etching Recipes →Process Control Data (DSEiii)
• 20:5920:59, 8 October 2024 diff hist +124 ICP Etching Recipes →Si Etching (Fluorine ICP Etcher)
• 20:5720:57, 8 October 2024 diff hist −124 ICP Etching Recipes →Si Etching (Fluorine ICP Etcher)
• 20:5420:54, 8 October 2024 diff hist −94 ICP Etching Recipes →Process Control Data (DSEiii)
• 20:5420:54, 8 October 2024 diff hist +94 ICP Etching Recipes →Process Control Data (DSEiii)
• 20:5120:51, 8 October 2024 diff hist −106 ICP Etching Recipes →Process Control Data (DSEiii)
• 20:4920:49, 8 October 2024 diff hist +106 ICP Etching Recipes →Process Control Data (DSEiii)
• 20:4720:47, 8 October 2024 diff hist −93 ICP Etching Recipes →DSEIII_(PlasmaTherm/Deep_Silicon_Etcher): DSE calibration etch information Tag: Visual edit