Stepper 3 (ASML DUV): Difference between revisions
Jump to navigation
Jump to search
m (moved Stepper 3 (ASML) to Stepper 3 (ASML DUV)) |
No edit summary |
||
| Line 11: | Line 11: | ||
|toolid=51 |
|toolid=51 |
||
}} |
}} |
||
fdagsdfg |
|||
= About = |
= About = |
||
Revision as of 23:02, 16 July 2012
|
fdagsdfg
About
The ASML DUV stepper is a 248nm line stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm. The system is a variable NA system and has a field image size of 21 x 21mm for 0.63 NA and a field size of 22mm x 27mm for 0.4 to 0.57NA. Overlay accuracy is better than 30nm. The system is configured for 4” wafers and pieces down to 14mm in size can be exposed using a 4” wafer as a carrier.