PECVD1 Recipes: Difference between revisions

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*[[media:PECVD1-SiON-Recipe.pdf|SiO<sub>x</sub>N<sub>y</sub> Deposition Recipes - Varying N/O Ratio]]
*[[media:PECVD1-SiON-Recipe.pdf|SiO<sub>x</sub>N<sub>y</sub> Deposition Recipes - Varying N/O Ratio]]
*[[media:PECVD1-SiON-Plot.pdf|SiO<sub>x</sub>N<sub>y</sub> Stress/Index vs. O/N Ratio]]
*[[media:PECVD1-SiON-Plot.pdf|SiO<sub>x</sub>N<sub>y</sub> Stress/Index vs. O/N Ratio]]
*[[media:|SiO<sub>x</sub>N<sub>y</sub> Standard Recipe]]
*[[media:PECVD1-SiON-recipe 2014 LS SION recipe.pdf|SiO<sub>x</sub>N<sub>y</sub> Standard Recipe]]
*[https://docs.google.com/spreadsheets/d/1rixyzAAq6q08M5OwvZiDVoh3K8B566XKM-UZAQIAnsg/edit#gid=sharing SiO<sub>x</sub>N<sub>y</sub> Data September 2014]
*[https://docs.google.com/spreadsheets/d/1rixyzAAq6q08M5OwvZiDVoh3K8B566XKM-UZAQIAnsg/edit#gid=sharing SiO<sub>x</sub>N<sub>y</sub> Data September 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEttR2JSTkRoamR0SUZ4bE5QUW9uS2c&usp=sharing SiO<sub>x</sub>N<sub>y</sub> 3000A Thickness uniformity 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEttR2JSTkRoamR0SUZ4bE5QUW9uS2c&usp=sharing SiO<sub>x</sub>N<sub>y</sub> 3000A Thickness uniformity 2014]

Revision as of 17:52, 1 October 2014

PECVD 1 (PlasmaTherm 790)

SiN deposition (PECVD #1)

  • Deposition rate~11.30nm/min (users must calibrate this prior to critical deps)
  • HF e.r.~90nm/min
  • Stress~444MPa
  • Refractive Index~1.940

SiO2 deposition (PECVD #1)

  • Deposition rate~35.22nm/min (users must calibrate this prior to critical deps)
  • HF e.r.~646nm/min
  • Stress~-407MPa
  • Refractive Index~1.460

SiOxNy deposition (PECVD #1)

  • Deposition rate~14.50nm/min (users must calibrate this prior to critical deps)
  • HF e.r.~399nm/min
  • Stress~145MPa
  • Refractive Index~1.714
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