PECVD1 Recipes: Difference between revisions
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* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Recipes]] |
* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Recipes]] |
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* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Plot]] |
* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Plot]] |
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== LS SiN deposition (PECVD #1) == |
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*[[media:PECVD1-LS SiN-Recipe.pdf|LS SiN Deposition Recipes - Varying N/O Ratio]] |
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*[[media:PECVD1-SiN-Plot.pdf|LS SiN Stress/Index vs. O/N Ratio]] |
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*[[media:PECVD1-LS SIN recipe 2014.pdf|LS SiN Recipe]] |
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*[https://docs.google.com/spreadsheets/d/1Joz0az9TGZWQc4CiMQJZzLBbNFbx_hH2Oc0B4NNJmYk/edit#gid=978933038=sharing LS SiN Data December 2014] |
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*[https://docs.google.com/spreadsheets/d/1xIzc2CufRYNSfAtsOXpw3IzHreeu42BWrLBV0kzP6kA/edit#gid=481681015=sharing LS SiN 3000A Thickness uniformity 2014] |
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Revision as of 17:00, 10 December 2014
PECVD 1 (PlasmaTherm 790)
SiN deposition (PECVD #1)
SiO2 deposition (PECVD #1)
Other recipes (PECVD1)
- SiOxNy Recipe
- SiOxNy Data 2014
- SiOxNy 3000A Thickness uniformity 2014
- LS SiN Recipe
- LS SiN Data 2014
- LS SiN 3000A Thickness uniformity 2014