PECVD1 Recipes: Difference between revisions

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=[[PECVD 1 (PlasmaTherm 790)]]=
=[[PECVD 1 (PlasmaTherm 790)]]=
== SiN deposition (PECVD #1) ==
== SiN deposition (PECVD #1) ==
*[[media:PECVD1-SiN-standard recipe 2014.pdf|SiN Standard Recipe]]
*[[ media: NewPECVD1-SiN-standard recipe 2014.pdf|SiN Standard Recipe]]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEN6LV93LXlnbUhIWU1adVZWMWlXYnc&usp=drive_web#gid=sharing SiN Data December 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEN6LV93LXlnbUhIWU1adVZWMWlXYnc&usp=drive_web#gid=sharing SiN Data 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dElmTXZyOEZsOFdrMVhNLWpKXzVmNWc&usp=sharing SiN 1000A Thickness uniformity 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dElmTXZyOEZsOFdrMVhNLWpKXzVmNWc&usp=sharing SiN 1000A Thickness uniformity 2014]
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*[[media:New PECVD1-LS SIN-Turner05recipe 2014 LS SIN recipe.pdf|LS SiN Recipe]]
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*[https://docs.google.com/spreadsheets/d/1Joz0az9TGZWQc4CiMQJZzLBbNFbx_hH2Oc0B4NNJmYk/edit#gid=978933038=sharing LS SiN Data 2014]
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*[https://docs.google.com/spreadsheets/d/1xIzc2CufRYNSfAtsOXpw3IzHreeu42BWrLBV0kzP6kA/edit#gid=481681015=sharing LS SiN 3000A Thickness uniformity 2014]
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* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Recipes]]
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* [[media:PECVD1-SiON-Recipe.pdf|Low Stress Si<sub>3</sub>N<sub>4</sub> - Variable Stress Plot]]

*Deposition rate~11.23nm/min (users must calibrate this prior to critical deps)
*HF e.r.~89nm/min
*Stress~450MPa
*Refractive Index~1.942


== SiO<sub>2</sub> deposition (PECVD #1) ==
== SiO<sub>2</sub> deposition (PECVD #1) ==
*[[media:PECVD1-SiO2-standard recipe 2014.pdf|SiO<sub>2</sub> Standard Recipe]]
*[[media:NewPECVD1-SiO2-standard recipe 2014.pdf|SiO<sub>2</sub> Standard Recipe]]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEw0bjFEdTF2SUhRa25Ca0d0SzBha3c&usp=drive_web#gid=sharing SiO<sub>2</sub> Data December 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEw0bjFEdTF2SUhRa25Ca0d0SzBha3c&usp=drive_web#gid=sharing SiO<sub>2</sub> Data 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDQ3VEtZQVRpdVdlbGtIZHpTNmFzNmc&usp=sharing SiO<sub>2</sub> 1000A Thickness uniformity 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDQ3VEtZQVRpdVdlbGtIZHpTNmFzNmc&usp=drive_web#gid=sharing SiO<sub>2</sub> 1000A Thickness uniformity 2014]


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== Other recipes (PECVD#1)==
*Deposition rate~35.52nm/min (users must calibrate this prior to critical deps)
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*[[media:PECVD1-LS SION-recipe2014 LS SION recipe.pdf|SiO<sub>x</sub>N<sub>y</sub> Recipe]]
*HF e.r.~645nm/min
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*[https://docs.google.com/spreadsheets/d/1rixyzAAq6q08M5OwvZiDVoh3K8B566XKM-UZAQIAnsg/edit#gid=sharing SiO<sub>x</sub>N<sub>y</sub> Data 2014]
*Stress~-408MPa
*Refractive Index~1.461

== SiO<sub>x</sub>N<sub>y</sub> deposition (PECVD #1) ==
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*[[media:PECVD1-SiON-Recipe.pdf|SiO<sub>x</sub>N<sub>y</sub> Deposition Recipes - Varying N/O Ratio]]
*[[media:PECVD1-SiON-Plot.pdf|SiO<sub>x</sub>N<sub>y</sub> Stress/Index vs. O/N Ratio]]
*[[media:PECVD1-LS SION recipe 2014.pdf|SiO<sub>x</sub>N<sub>y</sub> Recipe]]
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*[https://docs.google.com/spreadsheets/d/1rixyzAAq6q08M5OwvZiDVoh3K8B566XKM-UZAQIAnsg/edit#gid=sharing SiO<sub>x</sub>N<sub>y</sub> Data December 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEttR2JSTkRoamR0SUZ4bE5QUW9uS2c&usp=sharing SiO<sub>x</sub>N<sub>y</sub> 3000A Thickness uniformity 2014]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEttR2JSTkRoamR0SUZ4bE5QUW9uS2c&usp=sharing SiO<sub>x</sub>N<sub>y</sub> 3000A Thickness uniformity 2014]

*Deposition rate~14.99nm/min (users must calibrate this prior to critical deps)
*HF e.r.~417nm/min
*Stress~133MPa
*Refractive Index~1.714

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== LS SiN deposition (PECVD #1) ==
<!-- Placeholders - Not uploaded yet-->
*[[media:PECVD1-LS SiN-Recipe.pdf|LS SiN Deposition Recipes - Varying N/O Ratio]]
*[[media:PECVD1-SiN-Plot.pdf|LS SiN Stress/Index vs. O/N Ratio]]
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*[[media:PECVD1-LS SIN recipe 2014.pdf|LS SiN Recipe]]
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*[https://docs.google.com/spreadsheets/d/1Joz0az9TGZWQc4CiMQJZzLBbNFbx_hH2Oc0B4NNJmYk/edit#gid=978933038=sharing LS SiN Data December 2014]
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*[https://docs.google.com/spreadsheets/d/1xIzc2CufRYNSfAtsOXpw3IzHreeu42BWrLBV0kzP6kA/edit#gid=481681015=sharing LS SiN 3000A Thickness uniformity 2014]

*Deposition rate~14.99nm/min (users must calibrate this prior to critical deps)
*HF e.r.~417nm/min
*Stress~133MPa
*Refractive Index~1.714

Latest revision as of 23:22, 8 January 2015

PECVD 1 (PlasmaTherm 790)

SiN deposition (PECVD #1)

SiO2 deposition (PECVD #1)

Other recipes (PECVD#1)

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