Difference between revisions of "Stepper 3 (ASML DUV)"
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|picture=ASML.jpg |
|picture=ASML.jpg |
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|type = Lithography |
|type = Lithography |
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− | |super= |
+ | |super= Brian Thibeault |
− | |phone=(805)839- |
+ | |phone=(805)839-2268 |
|location=Bay 3 |
|location=Bay 3 |
||
− | |email= |
+ | |email=thibeault@ece.ucsb.edu |
|description = ASML PAS 5500/300 DUV Stepper |
|description = ASML PAS 5500/300 DUV Stepper |
||
|manufacturer = ASML |
|manufacturer = ASML |
Revision as of 17:27, 2 April 2015
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About
The ASML 5500 stepper is a 248nm DUV stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm. The system has a variable NA system and has a field image size of 21 x 21mm for 0.63 NA and a field size of 22mm x 27mm for 0.4 to 0.57 NA. Overlay accuracy is better than 30nm. The system is configured for 4” wafers and pieces down to 14mm in size can be exposed using a 4” wafer as a carrier.