Stepper 3 (ASML DUV): Difference between revisions
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|picture=ASML.jpg |
|picture=ASML.jpg |
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|type = Lithography |
|type = Lithography |
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|super= |
|super= Brian Thibeault |
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|phone=(805)839- |
|phone=(805)839-2268 |
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|location=Bay 3 |
|location=Bay 3 |
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|email= |
|email=thibeault@ece.ucsb.edu |
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|description = ASML PAS 5500/300 DUV Stepper |
|description = ASML PAS 5500/300 DUV Stepper |
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|manufacturer = ASML |
|manufacturer = ASML |
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Revision as of 00:27, 3 April 2015
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About
The ASML 5500 stepper is a 248nm DUV stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm. The system has a variable NA system and has a field image size of 21 x 21mm for 0.63 NA and a field size of 22mm x 27mm for 0.4 to 0.57 NA. Overlay accuracy is better than 30nm. The system is configured for 4” wafers and pieces down to 14mm in size can be exposed using a 4” wafer as a carrier.