Surface Analysis (KLA/Tencor Surfscan): Difference between revisions
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|picture=KLA.jpg |
|picture=KLA.jpg |
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|type = Inspection, Test and Characterization |
|type = Inspection, Test and Characterization |
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|super= |
|super= Tom Reynolds |
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|location=Bay 5 |
|location=Bay 5 |
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|description = ? |
|description = ? |
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Revision as of 21:21, 10 July 2015
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About
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.