Vacuum Deposition Recipes: Difference between revisions

From UCSB Nanofab Wiki
Jump to navigation Jump to search
No edit summary
No edit summary
Line 147: Line 147:
! bgcolor="#D0E7FF" align="center" | CeO<sub>2</sub>
! bgcolor="#D0E7FF" align="center" | CeO<sub>2</sub>
| bgcolor="EEFFFF" | <br>
| bgcolor="EEFFFF" | <br>
| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|Pt deposition (ALD)}}
| bgcolor="EEFFFF" | [[Sputtering Recipes|R]]
| bgcolor="EEFFFF" | <br>
| bgcolor="EEFFFF" | <br>
| bgcolor="EEFFFF" | <br>
| bgcolor="EEFFFF" | <br>
Line 375: Line 375:
! bgcolor="#D0E7FF" align="center" | ITO
! bgcolor="#D0E7FF" align="center" | ITO
| bgcolor="EEFFFF" | <br>
| bgcolor="EEFFFF" | <br>
| bgcolor="EEFFFF" | {{rl|E-Beam 2 Recipes|ITO deposition (E-Beam 2)}}
| bgcolor="EEFFFF" | {{rl|Sputtering Recipes|E-Beam 2 Recipes|ITO deposition (E-Beam 2)}}
| bgcolor="EEFFFF" | <br>
| bgcolor="EEFFFF" | <br>
| bgcolor="EEFFFF" | <br>
| bgcolor="EEFFFF" | <br>

Revision as of 22:56, 28 July 2016

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Vacuum Deposition Recipes

E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD)
Atomic Layer Deposition Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor)
Sputter 3
(ATC 2000-F)
Sputter 4
(ATC 2200-V)
Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Veeco Nexus)
Thermal
Evap 1
Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790)
PECVD 2
(Advanced Vacuum)
Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAL) Molecular Vapor Deposition (Tool)
Ag A
A A

A A








Al A
A A
R1 A R

A A




Al2O3 A A



A A
A




R1
AlN




R1 A A
A




R1
Au A
A A
R1 A R1

A A




B
















CeO2
R














Co A

A

R









Cr A

A

R


A A




Cu A




A A








Fe A

A

R









Ge A
A A

A A








GeO2 A
Gd A

A












Hf A















HfO2





A A






R1
In










A




Ir A















ITO
ITO deposition (E-Beam 2)



A A
A






MgF2 A A
MgO A
Mo A




R A








Nb A





R








Nd





A








Ni A
A A

R1


A A




NiCr A A
NiFe A A A
Pd A
A A





A A




Pt A
A A

A R






R1
Ru A

A












Si
A



A A




R R

SiN





R1 A
R

R1 R1 R1

SiO2 A A



R1 A
R

R1 R1 R1 R1
SiOxNy








A

R



Sn










A




SrF2
A














Ta A




R1 A








Ta2O5


A




R






Ti A
A A

A R1








TiN




A
R
A




R1
TiW A




A R1








TiO2
A


R1 A A
R




R1
V





A A








W A




A R1








Zn









A A




ZnO














R1
Zr A

A

A A








ZrO2














R1
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor)
Sputter 3
(ATC 2000-F)
Sputter 4
(ATC 2200-V)
Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Veeco Nexus)
Thermal
Evap 1
Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790)
PECVD 2
(Advanced Vacuum)
Unaxis VLR ICP-PECVD Atomic Layer Deposition (Oxford FlexAl) Molecular Vapor Deposition (Tool)