RIE Etching Recipes: Difference between revisions
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==SiO<sub>2</sub> Etching (RIE 3)== |
==SiO<sub>2</sub> Etching (RIE 3)== |
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*[[media:SiO2-Etch-Recipe-using-RIE-3-a.pdf|SiO<sub>2</sub> Etch Recipe with a very low surface damage - CHF<sub>3]] |
*[[media:SiO2-Etch-Recipe-using-RIE-3-a.pdf|SiO<sub>2</sub> Etch Recipe with a very low surface damage - CHF<sub>3]] |
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==SiN<sub>x</sub> Etching (RIE 3)== |
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*[[media:|SiO<sub>x</sub> Etch Recipe with a very low surface damage - CHF<sub>3]] |
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=[[RIE 5 (PlasmaTherm)]] = |
=[[RIE 5 (PlasmaTherm)]] = |
Revision as of 22:58, 13 January 2017
Back to Dry Etching Recipes.
RIE 1 (Custom)
RIE 2 (MRC)
CdZnTe Etching (RIE 2)
ZnS Etching (RIE 2)
ITO Etching (RIE 2)
InP-InGaAsP-InGaAlAs Etching (RIE 2)
RIE 3 (MRC)
SiO2 Etching (RIE 3)
SiNx Etching (RIE 3)
- [[media:|SiOx Etch Recipe with a very low surface damage - CHF3]]