RIE Etching Recipes: Difference between revisions
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*[[media:SiO2-Etch-Recipe-using-RIE-3-a.pdf|SiO<sub>2</sub> Etch Recipe with a very low surface damage - CHF<sub>3]] |
*[[media:SiO2-Etch-Recipe-using-RIE-3-a.pdf|SiO<sub>2</sub> Etch Recipe with a very low surface damage - CHF<sub>3]] |
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==SiN<sub>x</sub> Etching (RIE 3)== |
==SiN<sub>x</sub> Etching (RIE 3)== |
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*[[media:|SiN<sub>x</sub> Etch Recipe with a very low surface damage - CHF<sub>3]] |
*[[media:51-SiNx-Etch-Recipe-using-RIE3.pdf|SiN<sub>x</sub> Etch Recipe with a very low surface damage - CHF<sub>3]] |
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=[[RIE 5 (PlasmaTherm)]] = |
=[[RIE 5 (PlasmaTherm)]] = |
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Revision as of 22:59, 13 January 2017
Back to Dry Etching Recipes.