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News from the U.C. Santa Barbara Nanofabrication Facility |
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* New Plasma-Therm Versaline DSE III DRIE etcher will be up soon! |
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== New Deep Silicon Etcher == |
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New Plasma-Therm Versaline DSE III DRIE etcher is qualified and available for use. The new tool features much higher etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. [[User:John d|-- Demis]] ([[User talk:John d|talk]]) 22:16, 27 November 2017 (PST) |
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== 2016 Survey Results == |
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== CAIBE Ion Mill Available == |
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== NanoFiles SFTP Online == |
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Revision as of 06:16, 28 November 2017
News from the U.C. Santa Barbara Nanofabrication Facility
New Deep Silicon Etcher
New Plasma-Therm Versaline DSE III DRIE etcher is qualified and available for use. The new tool features much higher etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. -- Demis (talk) 22:16, 27 November 2017 (PST)
2016 Survey Results
See the May 2016 User Survey Results: Survey Results
CAIBE Ion Mill Available
The CAIBE (Oxford Ion Mill) is up and running! Contact Brian Lingg for more information. (7/2015)
NanoFiles SFTP Online
Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details. (7/7/2013)