Template:News: Difference between revisions
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News from the U.C. Santa Barbara Nanofabrication Facility |
News from the U.C. Santa Barbara Nanofabrication Facility |
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'''How to add new news items''' |
'''How to add new news items''' |
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* New news item should be inserted at the TOP of the list |
* New news item should be inserted at the TOP of the list |
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* Item titles should have a level 1 heading |
* Item titles should have a level 1 heading, like so: = MyArticleTitle = |
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* Each item should finish with the user signature (four tildes <nowiki>~~~~</nowiki>). When you |
* Each item should finish with the user signature (four tildes: <nowiki>~~~~</nowiki>). When you 'Save' the page, this will be replaced with a timestamp and your user name. The timestamp determines the order of items in the feed - items without a timestamp show up at the end. |
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= New Deep Silicon Etcher Online = |
= New Deep Silicon Etcher Online = |
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The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. [[User:John d|-- Demis]] ([[User talk:John d|talk]]) 22:16, 27 November 2017 (PST) |
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= 2016 Survey Results = |
= 2016 Survey Results = |
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Revision as of 06:53, 28 November 2017
News from the U.C. Santa Barbara Nanofabrication Facility
How to add new news items
- New news item should be inserted at the TOP of the list
- Item titles should have a level 1 heading, like so: = MyArticleTitle =
- Each item should finish with the user signature (four tildes: ~~~~). When you 'Save' the page, this will be replaced with a timestamp and your user name. The timestamp determines the order of items in the feed - items without a timestamp show up at the end.
- The
New Deep Silicon Etcher Online
The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. -- Demis (talk) 22:16, 27 November 2017 (PST)
2016 Survey Results
See the May 2016 User Survey Results. -- Brian Thibeault 12:00, 01 May 2016
CAIBE Ion Mill Available
The CAIBE (Oxford Ion Mill) is up and running! Contact Brian Lingg for more information. -- Brian Thibeault 12:00, 01 July 2015
NanoFiles SFTP Online
Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details. -- Brian Thibeault 12:00, 07 July 2013