Template:News: Difference between revisions
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= New Deep Silicon Etcher Online = |
= New Deep Silicon Etcher Online = |
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The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. [[User:John d|-- Demis]] ([[User talk:John d|talk]]) 22:16, 27 November 2017 (PST) |
The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. [[User:John d|-- Demis]] ([[User talk:John d|talk]]) 22:16, 27 November 2017 (PST) |
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= 2016 Survey Results = |
= 2016 Survey Results = |
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Revision as of 06:54, 28 November 2017
News from the U.C. Santa Barbara Nanofabrication Facility
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- The
New Deep Silicon Etcher Online
The new Plasma-Therm Versaline DSE III DRIE etcher has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. -- Demis (talk) 22:16, 27 November 2017 (PST)
2016 Survey Results
See the May 2016 User Survey Results. -- Brian Thibeault 12:00, 01 May 2016
CAIBE Ion Mill Available
The CAIBE (Oxford Ion Mill) is up and running! Contact Brian Lingg for more information. -- Brian Thibeault 12:00, 01 July 2015
NanoFiles SFTP Online
Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details. -- Brian Thibeault 12:00, 07 July 2013