Template:News: Difference between revisions
Jump to navigation
Jump to search
(added ' (PST)' to each item for proper date parsing) |
(CR between sigs) |
||
| Line 3: | Line 3: | ||
News from the U.C. Santa Barbara Nanofabrication Facility |
News from the U.C. Santa Barbara Nanofabrication Facility |
||
<!-- the following only shows up when viewing the |
<!-- the following only shows up when viewing the page source, but not when the page is viewed normally (eg. the RSS feed) --> |
||
<!-- |
|||
<noinclude> |
|||
'''How to add new news items''' |
'''How to add new news items''' |
||
| Line 11: | Line 11: | ||
* Each item should finish with the user signature (four tildes: <nowiki>~~~~</nowiki>). When you 'Save' the page, this will be replaced with a timestamp and your user name. The timestamp determines the order of items in the feed - items without a timestamp show up at the end. |
* Each item should finish with the user signature (four tildes: <nowiki>~~~~</nowiki>). When you 'Save' the page, this will be replaced with a timestamp and your user name. The timestamp determines the order of items in the feed - items without a timestamp show up at the end. |
||
* The |
* The |
||
--> |
|||
</noinclude> |
|||
| Line 17: | Line 17: | ||
= New Deep Silicon Etcher Online = |
= New Deep Silicon Etcher Online = |
||
The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. |
The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. |
||
[[User:John d|-- Demis]] ([[User talk:John d|talk]]) 22:16, 27 November 2017 (PST) |
|||
= 2016 Survey Results = |
= 2016 Survey Results = |
||
See the May 2016 {{file|Survey052016.pdf| User Survey Results}}. |
See the May 2016 {{file|Survey052016.pdf| User Survey Results}}. |
||
[[User:Thibeault|-- Brian Thibeault]] 12:00, 01 May 2016 (PST) |
|||
= CAIBE Ion Mill Available = |
= CAIBE Ion Mill Available = |
||
The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information. |
The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information. |
||
[[User:Thibeault|-- Brian Thibeault]] 12:00, 01 July 2015 (PST) |
|||
= NanoFiles SFTP Online = |
= NanoFiles SFTP Online = |
||
Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check [http://signupmonkey.ece.ucsb.edu SignupMonkey] for details. |
Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check [http://signupmonkey.ece.ucsb.edu SignupMonkey] for details. |
||
[[User:Thibeault|-- Brian Thibeault]] 12:00, 07 July 2013 (PST) |
|||
Revision as of 07:26, 28 November 2017
News from the U.C. Santa Barbara Nanofabrication Facility
New Deep Silicon Etcher Online
The new Plasma-Therm Versaline DSE III DRIE etcher has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer.
-- Demis (talk) 22:16, 27 November 2017 (PST)
2016 Survey Results
See the May 2016 User Survey Results.
-- Brian Thibeault 12:00, 01 May 2016 (PST)
CAIBE Ion Mill Available
The CAIBE (Oxford Ion Mill) is up and running! Contact Brian Lingg for more information.
-- Brian Thibeault 12:00, 01 July 2015 (PST)
NanoFiles SFTP Online
Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details.
-- Brian Thibeault 12:00, 07 July 2013 (PST)