Dry Etching Recipes

• R = Recipe is available. Clicking this link will take you to the recipe.
• A = Material is available for use, but no recipes are provided.

Dry Etching Recipes
	RIE Etching				ICP Etching					Oxygen Plasma Systems					Other Dry Etchers
Material	RIE 1 (Retired)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	DSEIII (PlasmaTherm)	SLR Fluorine ICP (PlasmaTherm)	ICP Etch 1 (Panasonic 1)	ICP Etch 2 (Panasonic 2)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	Plasma Clean (YES EcoClean)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)
Ag																	A
Al				A			R1	R1									A
Au																	R
Cr				A			R1	A									A
Cu																	A
Ge															A		A
Mo																	A
Ni																	R1
Pt																	R1
Ru							A	R1									A
Si					R1	R1									R1		A
Ta																	A
Ti							R1	A									A
Al2O3								R									A
Al2O3 (Sapphire)							R1	A									A
AlGaAs				R1			R1		GaAs-AlGaAs Etch (Unaxis VLR)								A
AlGaN									R1								A
AlN									R1								A
CdZnTe		R1															A
GaAs				R1			R1	R1	GaAs-AlGaAs Etch (Unaxis VLR)								A
GaN				R1			R1		R1								A
GaSb								A	GaSb Etch Unaxis VLR)								A
HfO2																	A
InGaAlAs		InP-InGaAsP-InGaAlAs Etching (RIE 2)							InP-InGaAs-InAlAs Etch (Unaxis VLR)								A
InGaAsP		InP-InGaAsP-InGaAlAs Etching (RIE 2)							InP-InGaAs-InAlAs Etch (Unaxis VLR)								A
InP		InP-InGaAsP-InGaAlAs Etching (RIE 2)					A	A	InP-InGaAs-InAlAs Etch (Unaxis VLR)								A
ITO		R1															A
Photoresist & ARC			A	R			R	R		A	A	A					A
SiC							R1	A									A
SiN			SiNx Etching (RIE 3)				R1	R1		A							A
SiO2			SiO2 Etching (RIE 3)			A	R1	R1								R1	A
SiOxNy							A	A									A
Ta2O5								A									A
TiN																	A
TiO2																	A
W-TiW							R1	A									A
ZnO2																	A
ZnS		R1															A
ZnSe		R1															A
ZrO2																	A
Material	RIE 1 (Retired)	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	DSEIII (PlasmaTherm)	SLR Fluorine ICP (PlasmaTherm)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	Plasma Clean (YES EcoClean)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)