Direct-Write Lithography Recipes: Difference between revisions

Revision as of 06:34, 14 September 2020

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Photolithography Recipes for the Heidelberg MLA150. Description of litho params- different lasers available, greyscale etc.

General notes: Hotplates used, filters, laser wavelengths, etc.

Resist	Spin Cond.	Bake	Thickness	Exposure Time	Focus Offset	PEB	Developer	Developer Time	Comments
SPR955CM0.9	3 krpm/30”	95°C/60”	~ 0.9 um				AZ300MIF		?? See SPR955CM data file

General notes: Hotplates used, filters, laser wavelengths, etc.

Resist	Spin Cond.	Bake	Thickness	Exposure Time	Focus Offset	PEB	Flood	Developer	Developer Time	Comments
AZ5214	6 krpm/30”	95°C/60”	~ 1.0 um				60"	AZ300MIF	60"	???

Description...

Resist	Spin Cond.	Bake	Thickness	Exposure Time	Focus Offset	PEB	Flood	Developer	Developer Time	Comments
AZ5214	6 krpm/30”	95°C/60”	~ 1.0 um				60"	AZ300MIF	60"	???

@@ Line 39: / Line 39: @@
 ''General notes: Hotplates used, filters, laser wavelengths, etc.''
+{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+|- bgcolor="#D0E7FF"
+! width="100" |Resist
+! width="100" |Spin Cond.
+! width="75" |Bake
+! width="75" |Thickness
+! width="125" |Exposure Time
+! width="100" |Focus Offset
+! width="75" |PEB
+! width="75" |Flood
+! width="100" |Developer
+! width="125" |Developer Time
+! width="300" |Comments
+|-
+|AZ5214
+|6 krpm/30”
+|95°C/60”
+|~ 1.0 um
+|
+|
+|
+|60"
+|AZ300MIF
+|60"
+| align="left" |
+*???
+|}
+=== Greyscale Lithography ===
+''Description...''
 {| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
 |- bgcolor="#D0E7FF"