YES-150C-Various-Resists: Difference between revisions
Jump to navigation
Jump to search
(Created page with "File:YES150CResists.jpg") |
(Text replacement - "/wiki/index.php" to "/w/index.php") |
||
(7 intermediate revisions by 3 users not shown) | |||
Line 1: | Line 1: | ||
Pressure drop indicates completion of etch. |
|||
⚫ | |||
Once pressure flattens etching is complete. |
|||
There is uncertainty in the exact completion time, somewhere between the peak pressure and the point where it goes flat. Using known PR thicknesses (spun at standard spin speeds - see the [https://wiki.nanotech.ucsb.edu/w/index.php?title=Lithography_Recipes#PositivePR datasheets]) you can estimate etch rate from these plots. |
|||
⚫ |
Latest revision as of 19:51, 4 September 2021
Pressure drop indicates completion of etch.
Once pressure flattens etching is complete.
There is uncertainty in the exact completion time, somewhere between the peak pressure and the point where it goes flat. Using known PR thicknesses (spun at standard spin speeds - see the datasheets) you can estimate etch rate from these plots.