Dry Etching Recipes

Process Control Data

See linked page for process control data (etch rate/etch profile calibration etches over time), for a selection of often-used etchers and etches.

Dry Etching Tools/Materials Table

• R = Recipe is available. Clicking this link will take you to the recipe.
• A = Material is available for use, but no recipes are provided.

Dry Etching Recipes
	RIE Etching			ICP Etching						Oxygen Plasma Systems					Other Dry Etchers
Material	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	DSEIII (PlasmaTherm)	Fluorine ICP (PlasmaTherm)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	Oxford ICP (PlasmaPro 100)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	Plasma Clean (YES EcoClean)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)
Ag																	A
Al			A			R1	R1										A
Au																	R1
Cr			A			R1	A										A
Cu																	A
Ge						A	A								A		A
Mo																	A
Nb						A	A
Ni																	R1
Os						A	A
Pt																	R1
Ru						A	R1										A
Si				R1	R1			A							R1		A
Ta						A	A										A
Ti						R1	A										A
Al2O3							R										A
Al2O3 (Sapphire)						R1	A										A
AlGaAs			R1			R1		R	GaAs-AlGaAs Etch (Unaxis VLR)								A
AlGaN								R	R1								A
AlN									R1								A
CdZnTe	R1																A
GaAs			R1			R1	R1	R	GaAs-AlGaAs Etch (Unaxis VLR)								A
GaN			R1			R1	A	R	R1								A
GaSb							A		GaSb Etch Unaxis VLR)								A
HfO2																	A
InGaAlAs	InP-InGaAsP-InGaAlAs Etching (RIE 2)							A	InP-InGaAs-InAlAs Etch (Unaxis VLR)								A
InGaAsP	InP-InGaAsP-InGaAlAs Etching (RIE 2)							R	InP-InGaAs-InAlAs Etch (Unaxis VLR)								A
InP	InP-InGaAsP-InGaAlAs Etching (RIE 2)					A	A	R	InP-InGaAs-InAlAs Etch (Unaxis VLR)								R1
ITO	R1																A
Photoresist & ARC		A	R		R	R	R			A	A	A					A
Ru						A	R
SiC						R1	A										A
SiN		SiNx Etching (RIE 3)			A	R1	R1			A							A
SiO2		SiO2 Etching (RIE 3)			R1	R1	R1									R1	A
SiOxNy						A	A										A
Ta2O5							A										A
TiN																	A
TiO2																	A
W-TiW						R1	A										A
ZnO2																	A
ZnS	R1																A
ZnSe	R1																A
ZrO2																	A
Material	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	DSEIII (PlasmaTherm)	Fluorine ICP (PlasmaTherm)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	Oxford ICP (PlasmaPro 100)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)	Plasma Clean (Gasonics 2000)	Plasma Clean (YES EcoClean)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)