Dry Etching Recipes: Difference between revisions
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===Dry Etching Tools/Materials Table=== |
===Dry Etching Tools/Materials Table=== |
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*<small>'''R''': ''Recipe is available. Clicking this link will take you to the recipe.''</small> |
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*<small>'''A''': ''Material is available for use, but no recipes are provided.''</small> |
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|[https://wiki.nanotech.ucsb.edu/w/index.php?title=ICP_Etching_Recipes#Al2O3_Etching_.28Panasonic_2.29 R] |
|[https://wiki.nanotech.ucsb.edu/w/index.php?title=ICP_Etching_Recipes#Al2O3_Etching_.28Panasonic_2.29 R] |
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! bgcolor="#d0e7ff" align="center" |CdZnTe |
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! bgcolor="#d0e7ff" align="center" |GaSb |
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|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaSb Etch Unaxis VLR)}} |
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! bgcolor="#d0e7ff" align="center" |ITO |
! bgcolor="#d0e7ff" align="center" |ITO |
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|{{rl|RIE Etching Recipes|ITO Etch (RIE 2)}} |
|{{rl|RIE Etching Recipes|ITO Etch (RIE 2)}} |
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! bgcolor="#d0e7ff" align="center" |Ta<sub>2</sub>O<sub>5</sub> |
! bgcolor="#d0e7ff" align="center" |Ta<sub>2</sub>O<sub>5</sub> |
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|[https://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-5-532 A] |
|[https://www.osapublishing.org/optica/abstract.cfm?uri=optica-4-5-532 A] |
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Revision as of 22:59, 7 July 2022
Process Control Data
See linked page for process control data (dep rate/stress etc. over time), for a selection of often-used thin-film depositions.
Dry Etching Tools/Materials Table
- R: Recipe is available. Clicking this link will take you to the recipe.
- A: Material is available for use, but no recipes are provided.