Chemical-Mechanical Polisher (Logitech): Difference between revisions

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{{tool|{{PAGENAME}}
{{tool2|{{PAGENAME}}
|picture=CMP.jpg
|picture=CMP.jpg
|type = Dry Etch
|type = Dry Etch
|super= Bill Millerski
|super= Bill Millerski
|super2= Don Freeborn
|phone=(805)839-3918x216
|phone=(805)839-3918x216
|location=Bay 5
|location=Bay 5
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=[[Instructions]]=
=[[Instructions]]=
https://wiki.nanotech.ucsb.edu/w/images/c/c0/CMP.pdf
CMP SOP

Latest revision as of 18:03, 30 August 2022

Chemical-Mechanical Polisher (Logitech)
CMP.jpg
Location Bay 5
Tool Type Dry Etch
Manufacturer Logitech
Description ORBIS Chemical Mechanical Polisher

Primary Supervisor Bill Millerski
(805) 893-2655
wmillerski@ucsb.edu

Secondary Supervisor

Don Freeborn


Recipes Dry Etch Recipes

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About

The Logitech Orbis system is used in the facility for fine-scale polishing and planarization of a variety of materials including glass, silicon, GaAs, InP, GaN, etc. Wafers up to 6” diameter can be polished on the system.

Several slurries and pads are available to provide a range of polishing options depending on the material being processed. Pieces can also be handled on the system by wax-mounting with the Logitech Bonder.

Each process is often unique in geometry and material combinations so that independent process development is required for most CMP applications.

Instructions

https://wiki.nanotech.ucsb.edu/w/images/c/c0/CMP.pdf