Holographic Lith/PL Setup (Custom): Difference between revisions

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|picture=Holograph.jpg
|picture=Holograph.jpg
|type = Lithography
|type = Lithography
|super= Ning Cao
|super= Demis D. John
|phone=(805) 839-5689
|location=Bay 6
|location=Bay 6
|description = Custom Interference Lithography
|email=Ningcao@ece.ucsb.edu
|description = Custom Built Interference Lithography
|manufacturer = Custom-Built Free-Space Optics
|manufacturer = Kimmon
|toolid=35
|toolid=35
}}
}}
= About =
==About==
The interference lithography system at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area. SPR3001 resist spin-coated to ~ 80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length.
The interference lithography system (aka. Holography) at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area.


[https://wiki.nanofab.ucsb.edu/w/images/3/33/XHRiC-Anti-Reflective-Coating.pdf XHRiC] bottom anti-reflection coating (BARC) & [[Lithography Recipes#Chemicals Stocked .2B Datasheets|THMR-3600HP]] imaging resist spin-coated to ~80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length.
⚫
=Detailed Specifications=

⚫
*15 mW single TEM mode HeCd laser
A photoluminescence measurement setup is co-located on the optical table. Please see the page for the PL system for more info:
⚫
*~ 2 cm x 2 cm uniform exposure area

⚫
*~ several minute exposure times
*[[Photoluminescence PL Setup (Custom)]]
⚫
*Grating period adjustable from ~200 to ~280 nm with a single stage

⚫
==Detailed Specifications==

⚫
*15 mW single TEM mode HeCd laser (Kimmon)
*Max sample size: ~1.5 inch square uniform exposure area
⚫
*~2 cm x 2 cm uniform exposure area
⚫
*Several-minute exposure times (manual shutter)
⚫
*Grating period adjustable from ~200 to ~280 nm with rotation stage
*Manual optics alignment.
*1-D and 2-D gratings possible, see recipes below.

==Recipes==

*[[Lithography Recipes#Holography%20Recipes|Lithography Recipes > Holography Recipes]] - developed recipes for 1D (line/space) and 2D (pillars) gratings.

Latest revision as of 03:48, 27 September 2023

Holographic Lith/PL Setup (Custom)
Holograph.jpg
Tool Type Lithography
Location Bay 6
Supervisor Demis D. John
Supervisor Phone (805) 893-5934
Supervisor E-Mail demis@ucsb.edu
Description Custom Interference Lithography
Manufacturer Custom-Built Free-Space Optics
Sign up for this tool


About

The interference lithography system (aka. Holography) at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area.

XHRiC bottom anti-reflection coating (BARC) & THMR-3600HP imaging resist spin-coated to ~80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length.

A photoluminescence measurement setup is co-located on the optical table. Please see the page for the PL system for more info:

Detailed Specifications

  • 15 mW single TEM mode HeCd laser (Kimmon)
  • Max sample size: ~1.5 inch square uniform exposure area
  • ~2 cm x 2 cm uniform exposure area
  • Several-minute exposure times (manual shutter)
  • Grating period adjustable from ~200 to ~280 nm with rotation stage
  • Manual optics alignment.
  • 1-D and 2-D gratings possible, see recipes below.

Recipes

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