Resistivity Mapper (CDE RESMAP): Difference between revisions
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|picture=CDEResmap.jpg |
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|type = Inspection, Test and Characterization |
|type = Inspection, Test and Characterization |
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|super= |
|super= Bill Millerski |
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|super2= Tony Bosch |
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|phone=(805)839-3918x217 |
|phone=(805)839-3918x217 |
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|location=Bay ? |
|location=Bay ? |
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=About= |
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The CDE Resmap 4 point resistivity mapper is used for measuring resistivity across the wafer for substrates and thin films deposited in the facility. The system can do automated resistivity mapping for pieces to 8 inch wafers. |
The CDE Resmap 4 point resistivity mapper is used for measuring resistivity across the wafer for substrates and thin films deposited in the facility. The system can do automated resistivity mapping for pieces to 8 inch wafers. |
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The resistivity range is 2 mOhm/Square to 5 MOhm/square. Contour plots, 3D plots, histograms, data exporting are supported from the Windows XP based control system. |
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==Instructions== |
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*[[CDE ResMap Quick-Start instructions]] |
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*[https://wiki.nanofab.ucsb.edu/w/images/3/37/CDE_ResMap_Operating_Instructions.pdf CDE ResMap Operating Instructions] |
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*System can export CSV files - contact supervisor for instructions. |
Latest revision as of 22:07, 30 October 2023
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About
The CDE Resmap 4 point resistivity mapper is used for measuring resistivity across the wafer for substrates and thin films deposited in the facility. The system can do automated resistivity mapping for pieces to 8 inch wafers.
The resistivity range is 2 mOhm/Square to 5 MOhm/square. Contour plots, 3D plots, histograms, data exporting are supported from the Windows XP based control system.
Instructions
- CDE ResMap Quick-Start instructions
- CDE ResMap Operating Instructions
- System can export CSV files - contact supervisor for instructions.