Tube Furnace (Tystar 8300): Difference between revisions
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=See Also= |
=See Also= |
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*[http://www.tystar.com/ Tystar] - Manufacturer of the tool |
*[http://www.tystar.com/ Tystar] - Manufacturer of the tool |
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*[http://www. |
*[http://www.cleanroom.byu.edu/OxideTimeCalc.phtml Silicon Thermal Oxide Thickness Calculator] - Use this on-line calculator to calculate times for silicon oxidation. |
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Revision as of 18:09, 28 June 2012
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About
The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for one tube each:
- Dry or wet oxidation of silicon
- Dry or wet oxidation of AlGaAs (or other materials)
- General furnace annealing
The tubes can hold up to twenty-five 8” wafers per cycle. We have boats for various wafer sizes, including pieces. The maximum temperature is 1050°C for the system. Gases used are O2, Steam from DI-H2O, N2.
Under the “ambient” variable use the following:
- Wet – 0.945
- Dry – 1.298
These numbers will give accurate growth calculations.
See Also
- Tystar - Manufacturer of the tool
- Silicon Thermal Oxide Thickness Calculator - Use this on-line calculator to calculate times for silicon oxidation.