Spin Rinse Dryer (SemiTool): Difference between revisions

Latest revision as of 18:02, 30 August 2022

Spin Rinse Dryer (SemiTool)

Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.

Each has a dedicated cassette that can hold up to 25 wafers.

The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm. A "Dry Only" option is also available.

@@ Line 1: / Line 1: @@
+{{tool2|{{PAGENAME}}
-Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.
-Each has a dedicated cassette that can hold up to 25 wafers.
-The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm.  A "Dry Only" option is also available.
-{{tool|{{PAGENAME}}
 |picture=SpinRinse.jpg
 |type = Wet Processing
-|super= Don Freeborn
+|super= Michael Barreraz
+|super2= Don Freeborn
-|location=Bay 7
+|location=Bay 5
 |description = ?
 |manufacturer =  SemiTool
 }}
+Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.
+Each has a dedicated cassette that can hold up to 25 wafers.
+The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm.  A "Dry Only" option is also available.