Holographic Lith/PL Setup (Custom): Difference between revisions
Jump to navigation
Jump to search
(header level set correctly, link to recipes page) |
mNo edit summary |
||
| (4 intermediate revisions by the same user not shown) | |||
| Line 1: | Line 1: | ||
{{ |
{{tool2|{{PAGENAME}} |
||
|picture=Holograph.jpg |
|picture=Holograph.jpg |
||
|type = Lithography |
|type = Lithography |
||
|super= |
|super= Demis D. John |
||
|super2 = Brian Thibeault |
|||
|phone=(805) 839-5689 |
|||
|location=Bay 6 |
|location=Bay 6 |
||
|description = Custom Interference Lithography |
|||
|email=Ningcao@ece.ucsb.edu |
|||
| |
|manufacturer = Custom-Built Free-Space Optics |
||
|manufacturer = Kimmon |
|||
|toolid=35 |
|toolid=35 |
||
}} |
}} |
||
==About== |
==About== |
||
===Holography Lithography=== |
|||
The interference lithography system (aka. Holography) at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area. |
The interference lithography system (aka. Holography) at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area. |
||
[https://wiki.nanofab.ucsb.edu/w/images/3/33/XHRiC-Anti-Reflective-Coating.pdf XHRiC] bottom anti-reflection coating (BARC) & [[Lithography Recipes#Chemicals Stocked .2B Datasheets|THMR-3600HP]] imaging resist spin-coated to ~80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length. |
[https://wiki.nanofab.ucsb.edu/w/images/3/33/XHRiC-Anti-Reflective-Coating.pdf XHRiC] bottom anti-reflection coating (BARC) & [[Lithography Recipes#Chemicals Stocked .2B Datasheets|THMR-3600HP]] imaging resist spin-coated to ~80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length. |
||
===Photoluminescence Measurement=== |
|||
A photoluminescence measurement setup is co-located on the optical table. Please see the page for the PL system for more info: |
A photoluminescence measurement setup is co-located on the optical table. Please see the page for the PL system for more info: |
||
*[[Photoluminescence PL Setup (Custom)]] |
*[[Photoluminescence PL Setup (Custom)|'''Photoluminescence PL Setup (Custom)''']] |
||
==Detailed Specifications== |
==Detailed Specifications== |
||
*15 mW single TEM mode HeCd laser |
*15 mW single TEM mode HeCd laser (Kimmon) |
||
*Max sample size: ~1.5 inch square |
*Max sample size: ~1.5 inch square uniform exposure area |
||
*~ |
*~2 cm x 2 cm uniform exposure area |
||
* |
*Several-minute exposure times (manual shutter) |
||
*Grating period adjustable from ~200 to ~280 nm with rotation stage |
*Grating period adjustable from ~200 to ~280 nm with rotation stage |
||
*Manual optics alignment. |
|||
*1-D and 2-D gratings possible, see recipes below. |
|||
== |
==Recipes== |
||
* |
*[[Lithography Recipes#Holography%20Recipes|Lithography Recipes > Holography Recipes]] - developed recipes for 1D (line/space) and 2D (pillars) gratings. |
||
Latest revision as of 23:54, 5 February 2025
| ||||||||||||||||||||||||||||||
About
Holography Lithography
The interference lithography system (aka. Holography) at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area.
XHRiC bottom anti-reflection coating (BARC) & THMR-3600HP imaging resist spin-coated to ~80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length.
Photoluminescence Measurement
A photoluminescence measurement setup is co-located on the optical table. Please see the page for the PL system for more info:
Detailed Specifications
- 15 mW single TEM mode HeCd laser (Kimmon)
- Max sample size: ~1.5 inch square uniform exposure area
- ~2 cm x 2 cm uniform exposure area
- Several-minute exposure times (manual shutter)
- Grating period adjustable from ~200 to ~280 nm with rotation stage
- Manual optics alignment.
- 1-D and 2-D gratings possible, see recipes below.
Recipes
- Lithography Recipes > Holography Recipes - developed recipes for 1D (line/space) and 2D (pillars) gratings.