Holographic Lith/PL Setup (Custom): Difference between revisions
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|picture=Holograph.jpg |
|picture=Holograph.jpg |
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|type = Lithography |
|type = Lithography |
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|super= Demis D. John |
|super= Demis D. John |
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|super2 = Brian Thibeault |
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|location=Bay 6 |
|location=Bay 6 |
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|description = Custom Interference Lithography |
|description = Custom Interference Lithography |
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|toolid=35 |
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==About== |
==About== |
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===Holography Lithography=== |
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The interference lithography system (aka. Holography) at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area. |
The interference lithography system (aka. Holography) at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area. |
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[https://wiki.nanofab.ucsb.edu/w/images/3/33/XHRiC-Anti-Reflective-Coating.pdf XHRiC] bottom anti-reflection coating (BARC) & [[Lithography Recipes#Chemicals Stocked .2B Datasheets|THMR-3600HP]] imaging resist spin-coated to ~80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length. |
[https://wiki.nanofab.ucsb.edu/w/images/3/33/XHRiC-Anti-Reflective-Coating.pdf XHRiC] bottom anti-reflection coating (BARC) & [[Lithography Recipes#Chemicals Stocked .2B Datasheets|THMR-3600HP]] imaging resist spin-coated to ~80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length. |
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===Photoluminescence Measurement=== |
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A photoluminescence measurement setup is co-located on the optical table. Please see the page for the PL system for more info: |
A photoluminescence measurement setup is co-located on the optical table. Please see the page for the PL system for more info: |
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*[[Photoluminescence PL Setup (Custom)]] |
*[[Photoluminescence PL Setup (Custom)|'''Photoluminescence PL Setup (Custom)''']] |
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==Detailed Specifications== |
==Detailed Specifications== |
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*Manual optics alignment. |
*Manual optics alignment. |
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*1-D and 2-D gratings possible, see recipes below. |
*1-D and 2-D gratings possible, see recipes below. |
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==Operating Procedures== |
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* [https://docs.google.com/document/d/1PFmkN9Br5jH1cdzAzTS0ZqL4g3SGOnbV/edit?usp=sharing&ouid=117965716847601392764&rtpof=true&sd=true Holography Std. Operating Procedures] - ''(by Gopi Meena)'' |
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==Recipes== |
==Recipes== |
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Latest revision as of 09:37, 6 December 2025
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About
Holography Lithography
The interference lithography system (aka. Holography) at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area.
XHRiC bottom anti-reflection coating (BARC) & THMR-3600HP imaging resist spin-coated to ~80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length.
Photoluminescence Measurement
A photoluminescence measurement setup is co-located on the optical table. Please see the page for the PL system for more info:
Detailed Specifications
- 15 mW single TEM mode HeCd laser (Kimmon)
- Max sample size: ~1.5 inch square uniform exposure area
- ~2 cm x 2 cm uniform exposure area
- Several-minute exposure times (manual shutter)
- Grating period adjustable from ~200 to ~280 nm with rotation stage
- Manual optics alignment.
- 1-D and 2-D gratings possible, see recipes below.
Operating Procedures
- Holography Std. Operating Procedures - (by Gopi Meena)
Recipes
- Lithography Recipes > Holography Recipes - developed recipes for 1D (line/space) and 2D (pillars) gratings.