Holographic Lith/PL Setup (Custom)

Holographic Lith/PL Setup (Custom) Location Bay 6 Tool Type Lithography Manufacturer Custom-Built Free-Space Optics Description Custom Interference Lithography Primary Supervisor Demis D. John (805) 893-5934 demis@ucsb.edu Secondary Supervisor Brian Thibeault Recipes SignupMonkey: Sign up for this tool

About

Holography Lithography

The interference lithography system (aka. Holography) at UCSB uses a 15mW, single-mode, 325 nm HeCd laser that is filtered and expanded by pinhole filters to produce the large area exposure beam. The system uses a simple mirror configuration with a fixed 90 degree angle between the mirror and sample. The entire mirror/sample assembly is rotated in 0.1 degree increments to change the grating pitch from ~ 200 nm to ~ 280 nm (35 to 55 degrees) over an ~ 2 cm x 2 cm exposure area.

XHRiC bottom anti-reflection coating (BARC) & THMR-3600HP imaging resist spin-coated to ~80 nm thickness is used for grating exposure. 2-D gratings can be formed by rotating the sample and doing multiple exposures. Total exposure times are controlled by a manual shutter and are generally several minutes in length.

Photoluminescence Measurement

A photoluminescence measurement setup is co-located on the optical table. Please see the page for the PL system for more info:

• Photoluminescence PL Setup (Custom)

Detailed Specifications

• 15 mW single TEM mode HeCd laser (Kimmon)
• Max sample size: ~1.5 inch square uniform exposure area
• ~2 cm x 2 cm uniform exposure area
• Several-minute exposure times (manual shutter)
• Grating period adjustable from ~200 to ~280 nm with rotation stage
• Manual optics alignment.
• 1-D and 2-D gratings possible, see recipes below.

Recipes

• Lithography Recipes > Holography Recipes - developed recipes for 1D (line/space) and 2D (pillars) gratings.