Stepper 3 (ASML DUV): Difference between revisions
Jump to navigation
Jump to search
No edit summary |
|||
| Line 6: | Line 6: | ||
|location=Bay 3 |
|location=Bay 3 |
||
|email=abrahamsen@ece.ucsb.edu |
|email=abrahamsen@ece.ucsb.edu |
||
|description = ASML PAS |
|description = ASML PAS 5500/300 DUV Stepper |
||
|manufacturer = ASML |
|manufacturer = ASML |
||
|materials = |
|materials = |
||
Revision as of 20:46, 11 March 2014
|
About
The ASML DUV stepper is a 248nm line stepper for imaging dense features down to below 200nm and isolated line structures down to below 150nm. The system is a variable NA system and has a field image size of 21 x 21mm for 0.63 NA and a field size of 22mm x 27mm for 0.4 to 0.57NA. Overlay accuracy is better than 30nm. The system is configured for 4” wafers and pieces down to 14mm in size can be exposed using a 4” wafer as a carrier.